Samsung Electronics Co., Ltd.

International Business Machines Corporation

Hewlett Packard Enterprise Development LP

Gaurav Kumar

Shashank Shrikant Agashe

Sameera Bharadwaja Hayavadana

Lakshmi Narayana Pedapudi

Sathyanarayanan Kulasekaran

Sarbajit Kumar Rakshit

Raghuveer Prasad Nagar

Harish B Kamath

Dongwoo Lee

Taehyoung Lee

Yunje Cho

Sung Ha Kim

Wan Sung Park

Chanwoo Park

Sudhir Senguttuvan

Avadhut Dipakrao Chaudhari

Rajaneesh Tiwari

Priya Ranjan Sinha

Supreeth Shadakshara Deva

Nimit S Chauhan

Systems and methods for brightfield inspection of a circular rotating wafer are provided. A method includes: acquiring a plurality of images of a circular wafer, that is rotating, by using a plurality of line cameras; obtaining a plurality of synchronized images, based on the plurality of images, by synchronizing a motion of the circular wafer, that is rotating, with at least one line camera from among the plurality of line cameras; obtaining a single wafer map by integrating together the plurality of synchronized images; obtaining an in-focus image of the single wafer map while the circular wafer is moving; and performing brightfield inspection of the circular wafer based on the in-focus image of the single wafer map.

System and method for brightfield inspection of circular rotating wafers

Example embodiments may provide methods for determining a quality of a film in spin coating process. The methods may include capturing images of portions of the film using an imaging device while coating the film on a substrate using a spinner. The imaging device may include SPCs and lens and/or SLMs. The methods may also include determining whether a characteristic of the film matches to a standard based on the images of the portions of the film. The method may further include performing detecting that the quality of the film is optimal in response to determining that the characteristic of the film matches to the standard or detecting that the quality of the film is not optimal in response to determining that the characteristic of the film does not match to the standard.

Methods and systems for real-time quality control of a film in a spin coating process

The present disclosure relates to a method for estimating heights of defects in a wafer. The method comprises creating an un-calibrated 3D model of a defect in a wafer, determining one or more attributes associated with the un-calibrated 3D model, transforming the un-calibrated 3D model to a calibrated 3D model, and estimating a height of the defect using the calibrated 3D model. Creating an un-calibrated 3D model corresponds to a defect present in a wafer based on a plurality of Scanning Electron Microscope (SEM) images of the defect. Transforming the un-calibrated 3D model to a calibrated 3D model uses a scaling factor corresponding to the determined one or more attributes associated with the un-calibrated 3D model. A height of the defect is estimated based on the calibrated 3D model of the defect.

Estimating heights of defects in a wafer by scaling a 3D model using an artificial neural network

A method, system, and computer program product for augmented reality-based environmental parameter filtering are provided. The method determines an environmental parameter by a wearable augmented reality (AR) device. A visualization of the environmental parameter is generated on a display of the wearable AR device. The method generates a set of control options on the display of the wearable AR device. The set of control options are configured to modify the environmental parameter. A user interaction with the wearable AR device is detected. The user interaction selects a control option of the set of control options. The method interacts with an external device to modify the environmental parameter based on the selected control option.

Augmented reality-based environmental parameter filtering

Provided is a method for virtually executing an operation of an energy dispersive x-ray spectrometry (EDS) system in real time production line by analyzing a defect included in a material undergoing inspection based on computer vision, the method including receiving a scanning electron microscope (SEM) image of the material including the defect, extracting an image-feature from the SEM image of the material, classifying the extracted image-feature under a predetermined label, predicting, based on the classified image-feature, an element associated with the defect included in the material and a shape of the predicted element, and grading the defect included in the material based on comparing the predicted element with a predetermined criteria.

Method and system for virtually executing an operation of an energy dispersive X-ray spectrometry (EDS) system in real-time production line

Examples disclosed herein relate to sharing policy and configuration information related to a configuration item (CI). In an example, a configuration item coupled to a network fabric that is managed via a first management platform may be identified. The configuration item may be managed via a second management platform. A policy associated with the CI may be determined from the second management platform. Configuration information related to the policy may be determined from the second management platform. The policy and the configuration information related to the policy may be stored. The policy and the configuration information related to the policy may be shared with first management platform, wherein the policy and the configuration information related to the policy may be useable to define configuration information for a configuration item managed via first management platform.

Sharing policy and configuration information related to a configuration item

An apparatus dynamically reallocates resources for optimized job performance in a distributed heterogeneous computer system that includes a plurality of computer nodes. The apparatus includes an application injector to invoke at least one job to be performed on at least one computer node among the computer nodes. The apparatus further includes a collector to dynamically collect a workload value on each computer node. The apparatus further includes a job informer to determine known and unknown jobs on each computer node. The apparatus further includes a job optimizer to determine a data distribution vector based on the workload value and the known and unknown jobs on each computer node. The data distribution vector defines an amount of data to be distributed among the computer nodes to perform the at least one job.

Dynamically reallocating resources for optimized job performance in distributed heterogeneous computer system

The present inventive concepts discloses methods, apparatuses, and/or systems for enabling spatially varying auto focusing of one or more objects using an image capturing system. The methods, apparatuses, and/or systems may include focusing objects in a region of interest using lenses, enabling spatially varying auto focusing of objects in the region of interest using a spatial light modulators (SLM), which are out of focus in the region of interest, and capturing the focused and the auto focused objects in the region of interest using a camera sensor.

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Bengaluru, India

Gaurav Kumar