Shipley Company LLC

Rohm and Haas Company

Fisher Scientific Company

The United States of America

Gary S Calabrese

Walter J Dressick

Jeffrey M Calvert

Roger F Sinta

Michael Gulla

Jacque H Georger, Jr

Mu-San Chen

Charles S Dulcey

John F Bohland

Daniel Y Pai

Angelo Anthony Lamola

Steven M Florio

Stephen S Rodriguez

Jeffrey J Doubrava

Prasit Sricharoenchaikit

Kevin J Cheetham

Juan C Scaiano

The invention relates to use of capture compounds such as a crown ether to facilitate selected compositions and processes employed in manufacture of electronic packaging devices such as printed circuit boards, semiconductor integrated circuit systems, multichip modules, lead frames and other interconnection devices, flat panel display substrates, and the like.

Capture compounds for electronic plating compositions and electronic packaging device manufacture

The present invention relates to novel compositions that contain an activator system that comprises a photoactivator, acid generator and chain extender. Methods and articles of manufacture that comprise such compositions are also provided. In a preferred aspect, the compositions are photoimageable.

Compositions comprising photoactivator, acid, generator and chain

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

Photoimageable resist compositions containing photobase generator

The invention is directed to a process for patterning a substrate in a selective pattern. In one embodiment, the process comprises the steps of forming a patterned coating over a substrate surface whereby portions of the substrate are covered by the patterned coating and portions of the substrate remain uncoated. A layer of a ligating material is coated over at least those portions of the substrate free of the patterned coating. The ligating layer is one that is capable of ligating with an electroless metal plating catalyst. The article so formed is then contacted with an electroless metallization catalyst and then with an electroless plating solution to form a patterned metal deposit on the substrate.

Selective metallization process

Methods and compositions for electroless metallization. In one aspect, the invention is characterized by the use of chemical groups capable of ligating with an electroless metallization catalyst, including use of ligating groups that are chemically bound to the substrate. In a preferred aspect, the invention provides a means for selective metallization without the use of a conventional photoresist patterning sequence, enabling fabrication of high resolution metal patterns in a direct and convenient manner.

Processes and compositions for electroless metallization

A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.

Near UV photoresist

A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.

Controlled electroless plating

Aqueous acidic ferrioxalate compositions are disclosed for use as calibrants of pCO2 and of PO2 after photodecomposition. Compositions with high iron(III) to oxalate molar ratios (e.g., 5:1 to 100:1 with 0.3 to 15 millimolar oxalate) produce carbon dioxide on exposure without oxygen consumption. Compositions with low iron(III) to oxalate ratios (e.g., 1:100 to 1:2000) with 0.1 to 5 millimolar iron(III) produce carbon dioxide on exposure with concurrent oxygen consumption. Use of the two types of compositions enables calibration values to be established with varying pCO2 values and with, respectively, high and low pO2 values.

Aqueous ferrioxalate compositions useful as calibrants

Electrodes for the measurement of pCO2 and/or pO2 are calibrated with an exposed aliquot of a calibration liquid. A constituent such as a ferrioxalate salt in the calibration liquid is converted to the gas in a reproducible concentration by exposure of the aliquot to light. In some instances, the calibration liquid is equilibrated with air prior to exposure. Some mechanisms of light generation of carbon dioxide also consume oxygen, so as to depress the pO2 value by a reproducible amount. The use of two different calibration liquids enables both one-point and two-point calibration of the Clark oxygen electrode and the Severinghaus pCO2 electrode of a blood gas instrument.

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North Andover, MA, United States of America

Gary S Calabrese