Brooks Automation Gmbh

Sumitomo Heavy Industries, Ltd.

Helix Technology Corporation

Sumitomo (shi) Cryogenics of America, Inc.

Shi-apd Cryogenics, Inc.

Sumitomo (shi) Cryogenic of America, Inc.

Sumitomo Cryogenics of America, Inc.

Gary S Ash

Allen J Bartlett

Bruce R Andeen

Paul E Dresens

Joseph Chopy, Jr

Y Roberto Than

James A O'Neil

Mark A Stira

Craig Hollabaugh

Frank P Jankowsky, Iii

Philip A Lessard

Maureen C Buonpane

Stephen J Yamartino

John Borchers

Paul Nickelsberg

Brian Thompson

Robert M Patterson

Alan C Brightman

Timothy M Pulling

Frank P Jankowsky Iii

A universal controller for integration of cryogenic equipment, requiring different control mechanisms, onto a single operating platform. The universal controller may include a power supply element that is configured to simultaneously drive a plurality of cryogenic devices that have different power supply requirements and a protocol translator element that is configured to enable communication between a plurality of cryogenic devices that use different, incompatible communication protocols, wherein the protocol translator element translates communications sent by a first type of cryogenic device from a first cryogenic device communication protocol into a second cryogenic device communication protocol and translates communications sent by a second type of cryogenic device from a second cryogenic device communication protocol into the first cryogenic device communication protocol, enabling the first type of cryogenic device and the second type of cryogenic device to communicate with each other.

Universal controller for integration of cryogenic equipment, requiring different control mechanisms, onto a single operating platform

A universal controller for integration of cryogenic equipment, requiring different control mechanisms, onto a single operating platform. The universal controller may include a power supply element that is configured to simultaneously drive a plurality PV of cryogenic devices that have different power supply requirements and a protocol translator element that is configured to enable communication between a plurality' of cryogenic devices that use different, incompatible communication protocols, wherein the protocol translator element translates communications sent by a first type of cryogenic device from a first cryogenic device communication protocol into a second cryogenic device communication protocol and translates communications sent by a second type of cryogenic device from a second cryogenic device communication protocol into the first cryogenic device communication protocol, enabling the first type of cryogenic device and the second type of cryogenic device to communicate with each other.

A helium management control system for controlling the helium refrigerant supply from a common manifold supplies cryogenic refrigerators with an appropriate helium supply. The system employs sensors to monitor and regulate the overall refrigerant supply to deliver an appropriate refrigerant supply to each of the cryogenic refrigerators depending on the computed aggregate cooling demand of all of the cryogenic refrigerators. An appropriate supply of helium is distributed to each cryopump by sensing excess and sparse helium and redistributing refrigerant accordingly. If the total refrigeration supply exceeds the demand, or consumption, excess refrigerant is directed to cryogenic refrigerators which can utilize the excess helium to complete a current cooling function more quickly. If the total refrigeration demand exceeds the total refrigeration supply, the refrigerant supply to some or all of the cryogenic refrigerators will be reduced accordingly so that detrimental or slowing effects are minimized based upon the current cooling function.

Helium management control system

A helium management control system for controlling the helium refrigerant supply from a common manifold supplies cryogenic refrigerators with an appropriate helium supply. The system employs sensors to monitor and regulate the overall refrigerant supply. An appropriate supply of helium is distributed to each cryopump. If the total refrigeration supply exceeds the demand, or consumption, excess refrigerant is directed to cryogenic refrigerators which can utilize the excess helium to complete a current cooling function more quickly. If the total refrigeration demand exceeds the total refrigeration supply, the refrigerant supply to some or all of the cryogenic refrigerators will be reduced accordingly so that detrimental or slowing effects are minimized based upon the current cooling function.

A helium management control system for controlling the helium refrigerant supply from a common manifold supplies a plurality of cryogenic refrigerators with an appropriate helium supply. The system employs a plurality of sensors to monitor and regulate the overall refrigerant supply to deliver an appropriate refrigerant supply to each of the cryogenic refrigerators depending on the computed aggregate cooling demand of all of the cryogenic refrigerators. An appropriate supply of helium is distributed to each cryopump by sensing excess and sparse helium refrigerant and redistributing refrigerant accordingly. If the total refrigeration supply exceeds the total refrigerant demand, or consumption, excess refrigerant is directed to cryogenic refrigerators which can utilize the excess helium to complete a current cooling function more quickly. Similarly, if the total refrigeration demand exceeds the total refrigeration supply, the refrigerant supply to some or all of the cryogenic refrigerators will be reduced accordingly so that detrimental or slowing effects are minimized based upon the current cooling function.

A direct current voltage to heat the sensor wire for powering and extracting a signal voltage from a thermocouple-type vacuum sensor. The direct current used produces a DC offset in the sensor output where the heating current flow is stopped for a short interval and the unbiased sensor voltage is then sampled and stored.

Interrupted DC operation of thermocouple vacuum gauge

The present system and method provides a mechanism for monitoring the level of fullness of a cryopump by measuring the cryopump adsorption capacity. An ion gauge or other total pressure gauge is in contact with the condensing or adsorbing panels of the pump. The gauge sensor, for example, can be connected to a tube or duct leading to the central core of the pump where the adsorbing charcoal is located. At this location in the pump, the gauge is exposed to low-boiling-point gases, such as hydrogen, neon and helium, while being substantially shielded from other gases such as nitrogen, argon, oxygen, or water vapor. By connecting a gauge to this location of the pump, the gauge can be used to monitor the absorption capacity of the pump.

Method and apparatus for detecting and measuring state of fullness in cryopumps

A single ducted valve assembly provides an integrated cryopump valve having a purge valve port connecting the assembly to a cryopump with a coaxial connection having an inner duct and an outer duct. A pressurized gas interface connects a pressurized gas source to the cryopump through the inner duct. A rough valve port can connect the outer duct of the assembly to a rough vacuum pump; and a relief valve port can connect the outer duct of the assembly to an exhaust stack.

Integrated rough/purge/vent (RPV) valve

A vacuum conduit connected to a vacuum pump has a shield surface which absorbs radiation to reduce the total radiation falling on the vacuum pump. The vacuum system includes the vacuum conduit connected between a process chamber and the vacuum pump and a surface treatment along at least a portion of the shield surface adapted to absorb radiation. Since the treatment is on the interior surface of the vacuum conduit and does not extend into the center of the conduit, gaseous flow to the pump is not impeded. In this manner radiation entering the vacuum pump and falling on the cryogenic array is reduced without impeding gaseous flow to the cryogenic surface. The system therefore minimizes the radiation load on the cryogenic array in the vacuum pump without impeding the gaseous flow through the vacuum pump.

Radiation shielding coating

A cryopump is regenerated by roughing the cryopump during purging. Purging and roughing is carried out in first a high temperature mode and then a lower ambient temperature mode. In the lower temperature mode, the cryogenic refrigerator is turned on. If the system fails a rough test after roughing at the lower temperature, it is repurged with the rough valve open.

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Dartmouth, MA, United States of America

Gary S Ash