E.i. Dupont De Nemours and Company

The Chemours Company Fc, LLC

Gary Loh

Joseph Anthony Creazzo

Joseph A Creazzo

Sheng Peng

Mark L Robin

Yoshimasa Oosaki

Oosaki Yoshimasa

The present invention relates to fluoroolefin compositions useful as gases for CVD semiconductor manufacture, particularly for etching applications including methods for removing surface deposits from the interior of a chemical vapor deposition chamber by using an activated gas mixture, and methods for etching the surface of a semiconductor.

Chamber cleaning and semiconductor etching gases

Foam-forming compositions containing azeotropic or azeotrope-like mixtures containing cis-1,1,1,4,4,4-hexafluoro-2-butene are disclosed. The foam-forming composition contains (a) an azeotropic or azeotrope-like mixture of cis-1,1,1,4,4,4-hexafluoro-2-butene with methyl formate, 1,1,1,3,3-pentafluorobutane, trans-1,2-dichloroethylene, pentane, isopentane, cyclopentane, HFC-245fa, or dimethoxymethane; and (b) an active hydrogen-containing compound having two or more active hydrogens. Also disclosed is a closed-cell polyurethane or polyisocyanurate polymer foam prepared from reaction of an effective amount of the foam-forming composition with a suitable polyisocyanate. Also disclosed is a process for producing a closed-cell polyurethane or polyisocyanurate polymer foam by reacting an effective amount of the foam-forming composition with a suitable polyisocyanate.

Foam-forming compositions containing azeotropic or azeotrope-like mixtures containing Z-1,1,1,4,4,4-hexafluoro-2-butene and methyl formate and their uses in the preparation of polyisocyanate-based foams

A foam-forming composition is disclosed which includes both cis-1,1,1,4,4,4-hexafluoro-2-butene and a poorly compatible active hydrogen-containing compound having two or more active hydrogens. Also disclosed is a closed-cell polyurethane or polyisocyanurate polymer foam prepared from reaction of effective amounts of the foam-forming composition and a suitable polyisocyanate. Also disclosed is a process for producing a closed-cell polyurethane or polyisocyanurate polymer foam by reacting an effective amount of the foam-forming composition with a suitable polyisocyanate.

Compositions and use of cis-1,1,1,4,4,4-hexafluoro-2-butene foam-forming composition in the preparation of polyisocyanate-based forms

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Newark, DE, United States of America

Gary Loh