Taiwan Semiconductor Manufacturing Comp. Ltd.

Gary Chan

Pinyen Lin

Keng-Chu Lin

Li-Te S Lin

Tzer-Min Shen

Han-Yu Lin

Fu-Ting Yen

Yen-Tien Tung

Jhih-Rong Huang

Yen-Huei Chen

Shao-Yu Chou

Jui-Jen Wu

The present disclosure describes a semiconductor structure and a method for forming the same. The method can include forming a fin structure over a substrate. The fin structure can include a channel layer and a sacrificial layer. The method can further include forming a first recess structure in a first portion of the fin structure, forming a second recess structure in the sacrificial layer of a second portion of the fin structure, forming a dielectric layer in the first and second recess structures, and performing an oxygen-free cyclic etching process to etch the dielectric layer to expose the channel layer of the second portion of the fin structure. The oxygen-free cyclic etching process can include two etching processes to selectively etch the dielectric layer over the channel layer.

Spacer structure for semiconductor device and method for forming the same

A bootstrap voltage generating circuit includes a bias circuit having a first end coupled to a first power source node having an operation voltage, and a second end coupled to a low voltage reference potential, wherein a voltage at the first end is related to the operation voltage in a non-linear way; a charging capacitor having a first end coupled to the load circuit; a charging path between a second end of the charging capacitor and the first end of the bias circuit, wherein the charging path is responsive to a clock signal; a discharging path between the second end of the charging capacitor and the low voltage reference potential, wherein the discharging path is responsive to the clock signal; and a switch circuit connected to the first end of the charging capacitor for setting a voltage thereon, wherein the switch circuit is responsive to the clock signal.

Bootstrap voltage generating circuits

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Taipei, Taiwan

Gary Chan