Industry-university Cooperation Foundation Sogang University

Gap Su Han

Jong Sung Lim

Young Hoon Kwon

Ki Pung Yoo

A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided.

Cleaning apparatus and high pressure cleaner for use therein

Provided is a cleaning process which is simplified and in which a time required for the cleaning process is reduced and which has an excellent cleaning effect. The cleaning process comprises loading a wafer in a high pressure cleaner, injecting high-purity gaseous carbon dioxide (CO) having low pressure into the high pressure cleaner, injecting COhaving lower pressure than supercritical cleaning pressure into the high pressure cleaner, cleaning the wafer by injecting a supercritical homogeneous transparent phase mixture in which a cleaning additive and supercritical COare mixed, into the high pressure cleaner under a supercritical cleaning pressure, rinsing the wafer by injecting a supercritical rinsing mixture in which a rinsing additive and supercritical COare mixed, into the high pressure cleaner, and separating COfrom a mixture discharged from the high pressure cleaner.

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Yongin, South Korea

Gap Su Han