Skyverse Technology Co., Ltd.

Ak Optics Technology Co., Ltd.

Gaozeng Cui

Tao Liu

Wei Xiong

Lu Chen

Guoguang Li

Langfeng Wen

Timmy Wang

Youwei Huang

The present invention provides a detection device and a detection method. The detection device uses the signal light formed by the interference of the first and the second echo lights reflected on the surface of the component to be detected to obtain the first light intensity distribution information of the signal light corresponding to the sampling position on the component to be detected by the first detection device to obtain the phase distribution of the signal light according to the intensity distribution to obtain the defect distribution data of the component to be detected. Among them, the first detection apparatus includes more than two polarization detectors, or a non-polarization detector and at least one polarization detector. The present invention can effectively achieve the polarization state analysis of the signal light, achieve the high-precision detection of the component to be detected in the longitudinal direction, and have advantages of good reliability, high stability and fast detection speed.

Device and method for detecting a surface defect using interference between polarized lights

A method for conducting optical measurement using a full Mueller matrix ellipsometer, which belongs to the technical field of optical measurements. The optical measurement method comprises: constructing an experimental optical path of a full Mueller matrix ellipsometer; conducting complete regression calibration on the full Mueller matrix ellipsometer; placing a sample to be measured on a sample platform, and obtaining an experimental Fourier coefficient of the sample to be measured; and according to the experimental Fourier coefficient of the sample to be measured, obtaining information about the sample to be measured. Since a calibration method for the full Mueller matrix ellipsometer is not only simple in operation process, but also makes full use of data of the full Mueller matrix ellipsometer measured at the same time, the introduced error is relatively small and the parameter obtained by calibration is more accurate, so that the measurement result is more accurate when the sample to be measured is measured. Thus, the process of the optical measurement method is simplified.

Method for conducting optical measurement usingfull Mueller matrix ellipsometer

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Beijing, China

Gaozeng Cui