Shanghai Micro Electronics Equipment Co., Ltd.

Covestro Deutschland Ag

Bip Patents

Gang Sun

Jun Zhang

Li Fang

Jinhua Min

Mingying Ma

Yi Shen

Yanping Lan

Hui Zhao

Chenxi Zhang

Chen Xi Zhang

A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two exposures performed in a same exposure field during a stepping and exposing process of the reticle stage (S); obtaining a plurality of second positional deviations between two groups of patterns formed respectively after another two exposures performed in a same exposure field during a stepping and exposing process of the workpiece stage (S); subtracting motional errors of the reticle stage and/or workpiece stage from each of the plurality of first and second positional deviations to obtain corresponding first and second corrected deviations (S, S); calculating differences each between a pair of corrected deviations (S); and calculating the distortion of the projection objective by a fitting process (S).

Method for measuring distortion of projection objective

Growing community of inventors

Shanghai, China

Gang Sun