Air Products and Chemicals, Inc.

Versum Materials US, LLC

Samsung Electronics Co., Ltd.

Gang Chris Han-Adebekun

Tianniu Chen

Wen Dar Liu

Yi-Chia Lee

Steffen Zahn

Shiying Zheng

Laisheng Sun

Thomas John Markley

Michael Scott Lowry

Described herein is an etching solution suitable for both tungsten-containing metals and GST metals, which comprises: water; at least one phenolic derivative compound having at least two hydroxyl groups; at least one strong base selected from the group consisting of (i) a quaternary base; (ii) an organic amine; and (iii) a metal hydroxide; optionally an ammonium salt of an organic acid; and optionally a water-miscible solvent, wherein the pH of the etching solution is 10 or greater, and wherein the etching solution is substantially free of a peroxide oxidizer and a metal ion-containing oxidizer.

Etching solution for tungsten and GST films

An aqueous dispersion and a method for making an aqueous dispersion. The dispersion including at least one conductive polymer such as a polythienothiophene, at least one ether containing polymer and optionally at least one colloid-forming polymeric acid and one non-fluorinated polymeric acid. Devices utilizing layers formed of the inventive dispersions are also disclosed.

Electrically conductive films formed from dispersions comprising polythiophenes and ether containing polymers

An aqueous dispersion including a partially fluorinated dispersant, an electrically conductive polymer and a film forming additive. The film forming additive includes a boiling temperature greater than about 85&#xb0; C. (185&#xb0; F.). In addition, the concentration of the film forming additive is less than the solubility limit of the additive in water. The dynamic surface tension of the dispersion including the film forming additive is less than about 60 dynes/cm at 100 ms surface age. A method for making an electrically conductive polymer film and devices including electrically conductive polymer film are also disclosed.

Film forming additive formulations of conductive polymers

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Gang Chris Han-Adebekun