Lambda Physik Ag

G&uuml;nter Nowinski

Uwe Stamm

Juergen Kleinschmidt

Hans-Stephan Albrecht

Matthias Kramer

Marcus Serwazi

A lithography laser system for incorporating with a semiconductor processing system includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected with a discharge circuit for energizing the laser gas, a resonator including the discharge chamber for generating a laser beam, and a processor. The processor runs an energy control algorithm and sends a signal to the discharge circuit based on said algorithm to apply electrical pulses to the electrodes so that the laser beam exiting the laser system has a specified first energy distribution over a group of pulses. The energy control algorithm is based upon a second energy distribution previously determined of a substantially same pattern of pulses as the group of pulses having the first energy distribution. The second energy distribution is determined for the laser beam at a location after passing the beam through beam shaping optical elements of the semiconductor processing system while a value of the energy of the laser beam exiting the laser system is maintained at an approximately constant first energy.

Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser

An E-Diagnostic system for monitoring a state of an excimer laser or molecular fluorine laser system includes a processing device and an interface. The processing device runs a program for outputting parameter requests to the laser system, receiving parameter values from the laser system in response to the parameter requests, and storing the parameter values such that a record of the state of the excimer or molecular fluorine laser system is kept. The interface signal-couples the processing device with the laser system permitting the outputting of the parameter requests and the receiving of the parameter values between the processing device and the laser system.

E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source systems

Growing community of inventors

Unterwellenborn, Germany

Günter Nowinski

Growing community of inventors

Unterwellenborn, Germany

G&uuml;nter Nowinski

Günter Nowinski