Unaxis Deutschland Holding Gmbh

Balzers Und Leybold Deutschland Holding Ag

G&ouml;tz Teschner

Joachim Szczyrbowski

Anton Zmelty

J&uuml;rgen Bruch

Dietmar Marquardt

A process gas source ( ) is connected to the vacuum chamber ( ), and a metering valve ( ) actuated by an automatic controller is installed between the vacuum chamber ( ) and the process gas source ( ). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber ( ) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit ( ), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas.

Apparatus for applying thin layers to a substrate

A sputtering electrode is switched between two power values at a constant reactive gas flow rate which is selected so that the target of the sputtering electrode is in the metallic mode at the first power value while in the oxide mode at a second power value.

Configuration for coating a substrate by means of a sputtering device

Power supply lines (,) connect poles of an alternating current power source (,) to respective cathodes (,) in compartments (,), included among a plurality of adjacent compartments (,), which together form a vacuum chamber (,) and which are connected to each other by a passageway (,). The two compartments (,) with the cathodes (,) are separated from each other by intermediate compartments (,), at least some of which are equipped with additional sputter cathodes (,).

Growing community of inventors

Hanau, Germany

Götz Teschner

Growing community of inventors

Hanau, Germany

G&ouml;tz Teschner

Götz Teschner