J.a. Woollam Co.

J.a. Wooliam Co., Inc.

James D. Welch

Galen L Pfeiffer

Martin M Liphardt

Ping He

Blaine D Johs

Craig M Herzinger

Jeffrey S Hale

John A Woollam

Brian D Guenther

Christopher A Goeden

Steven E Green

Thomas E Tiwald

James D Welch

Gerald T Cooney

Duane E Meyer

James N Hilfiker

Daniel W Thompson

Griffin A P Hovorka

Brooks A Hitt

Christopher D Hassler

Martin M Lihardt

Chris Goeden

Systems for and methodology of calibration, as well as testing of beam directing Ellipsometer systems which utilize polarized electromagnetic radiation to investigate samples.

System for, and calibration and testing of directed beam ellipsometer systems

An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.

Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meet the scheimpflug condition and overcomes keystone error

A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with reduced effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.

Beam focusing and reflective optics

Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meets scheimpflug condition and overcomes keystone error

Ellipsometers and polarimeters and the like having at least one rotating element which is driven by a motor that comprises air bearings.

Ellipsometer or polarimeter system having at least one rotating element which is driven by a motor comprising air bearing

A sample positioning system having two rotation elements with offset therebetween, to the second of which rotation elements is affixed a sample supporting stage. The rotation axes of the two rotation element are parallel, or substantially so. The sample positioning system finds application in the mapping of samples by Metrology systems such as Reflectometer, Spectrophotometer and Ellipsometer systems.

Theta-theta sample positioning stage with application to sample mapping using reflectometer, spectrophotometer or ellipsometer system

In ellipsometer and polarimeter systems, reflective optics including both convex and a concave mirrors that have beam reflecting surfaces, as well as aperture control of beam size to optimize operation with respect to aberration and diffraction effects while achieve the focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved, and further including detectors of electromagnetic radiation that enable optimization of the operation thereof for application over various specific wavelength ranges, involving functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics.

Beam focusing and reflecting optics with enhanced detector system

A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.

A reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved. This invention is also a combination of a focusing element and a filtering element that provides an optimum electromagnetic beam cross-sectional area based on optimizing the beam cross-sectional area in view of conflicting effects of aberration and diffraction inherent in said focusing element, which, for each wavelength, vary oppositely to one another with electromagnetic beam cross-sectional area.

Beam focusing and beam collecting optics with wavelength dependent filter element adjustment of beam area

In the context of an ellipsometer or the like, positioning a camera other than directly above a sample being investigated by an electromagnetic beam, while said camera provides an optical view of a surface of said sample which is in focus over the entire viewed extent of the sample, and wherein a contrast improving system involving two beams provided by a beam splitting system is utilized.

System for viewing samples that are undergoing ellipsometric investigation in real time

A method of calibrating a reflective focusing optics to provide a system that minimizes the effect of multiple beam reflections therewithin on polarization state reflective optics system that preferably requires the presence of both convex and a concave mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample, (which can be along a locus differing from that of an input beam), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved.

Beam focusing and beam collecting optics

A reflective optics system that preferably requires the presence of both convex and a concave mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample, (which can be along a locus differing from that of an input beam), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved.

Reflective focusing optics

A system for easily determining average ellipsometric parameters based on data obtained from two different locations on a planar or non-planar shaped object, along with its method of use.

System for determining average ellipsometric parameters for planar or non-planar shaped objects, and method of its use

A system for monitoring, in real time, relatively large samples as they are caused to pass by an ellipsometer or the like system, and method of its use.

Growing community of inventors

Lincoln, NE, United States of America

Galen L Pfeiffer