Kabushiki Kaisha Toyota Chuo Kenkyusho

Toyota Jidosha Kabushiki Kaisha

Gaku Kitahara

Hiroyuki Mori

Toshio Horie

Ken-ichi Suzuki

Nobuaki Suzuki

Ayaka Kagami

Kazuyuki Nakanishi

Fumio Shimizu

Tadashi Oshima

Kazuaki Nishino

Jun Yaokawa

Kohei Takahashi

Takashi Iseki

Takao Kobayashi

Hideaki Matsuoka

Tomohiko Sekiguchi

Yuka Yamada

Tatsuyuki Amago

Kyosuke Izuno

Isamu Ueda

Shigeki Oshima

Ken-Ichi Suzuki

A method of manufacturing a member for fastening by joining a nut with a tubular joint portion extending from a main body formed with an internal thread to a panel with a mounting hole for the nut on an aluminum base material. The joint portion has a rotation-preventing portion with a concave and convex shaped outer peripheral surface and a guide portion extending from the rotation-preventing portion to one side. After the guide portion is inserted into the mounting hole, the nut is energized by electrodes in contact with both nut end surface sides. The nut then generates heat, and the periphery of the mounting hole is heated and softened. When the nut is pressurized with the electrodes, the rotation-preventing portion bites into the mounting hole, and the one end portion of the guide portion is swaged to become a retaining portion on one surface side of the panel.

Member for fastening and method of manufacturing same

A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg. C.

Conductive film, corrosion-resistant conduction film, corrosion-resistant conduction material and process for producing the same

There is provided an electron conductive and corrosion-resistant materialcontaining titanium (Ti), boron (B) and nitrogen (N) in an atomic ratio satisfying 0.05&#x2266;[Ti]&#x2266;0.40, 0.20&#x2266;[B]&#x2266;0.40, and 0.35&#x2266;[N]&#x2266;0.55 (provided that [Ti]+[B]+[N]=1). Further, there is provided a method of manufacturing an electron conductive and corrosion-resistant material, wherein boron nitride powder adheres to the surface of a substrateof which at least the surface is made of titanium or a titanium alloy, and is then heated. Furthermore, there is provided a method of manufacturing an electron conductive and corrosion-resistant material, wherein the surface of a substrateof which at least the surface is made of titanium or a titanium alloy is borided and then heated. In addition, there is provided a method of manufacturing an electron conductive and corrosion-resistant material, wherein a TiBlayer formed of TiBparticles is formed by spraying TiBpowder onto a metal substrateand then nitriding the TiBlayer.

Metal separator for fuel cell and method for producing the same

The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sphybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Cspand the like to increase a structure comprising Csp. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sphybrid orbital, and a heterocyclic compound gas containing carbon having an sphybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.

Amorphous carbon film, process for forming amorphous carbon film, conductive member provided with amorphous carbon film, and fuel cell separator

Growing community of inventors

Aichi-gun, Japan

Gaku Kitahara