Samsung Electronics Co., Ltd.

Gaeun Kim

Jaeduk Lee

Kyounghoon Kim

Sejun Park

Joohee Park

Yoonhwan Son

Jeongseok Lee

Seokwoo Hong

Joonam Kim

A semiconductor device may include a plurality of gate electrodes apart from each other in a vertical direction on a substrate; a plurality of channel structures penetrating the plurality of gate electrodes and extending in the vertical direction; and a plurality of bit lines arranged on and connected to the plurality of channel structures. The plurality of bit lines may include a plurality of lower bit lines and a plurality of upper bit lines at different vertical levels from each other to constitute at least two layers. The plurality of upper bit lines may be apart from each other in a first horizontal direction and extend in parallel with each other in a second horizontal direction perpendicular to the first horizontal direction. A lower expansion space may be defined between two lower bit lines adjacent to each other among the plurality of lower bit lines.

Semiconductor device and electronic system including the same

A semiconductor device and data storage system, the device including a substrate having a first region, a second region surrounding the first region, and a third region surrounding the second region; a memory structure on the first region; a first defect detector on the second region; and a dam structure on the third region, wherein the dam structure surrounds the first defect detector and includes a plurality of conductive lines stacked on the third region.

Semiconductor devices having a defect detector and data storage systems including the same

A three-dimensional semiconductor memory device includes a peripheral circuit structure having peripheral circuits on a semiconductor substrate, and landing pads connected to the peripheral circuits, an electrode structure on the peripheral circuit structure, the electrode structure including vertically stacked electrodes, a planarized dielectric layer that covers the electrode structure, peripheral through plugs spaced apart from the electrode structure, the peripheral through plugs penetrating the planarized dielectric layer to connect to the landing pads, conductive lines connected through contact plugs, respectively, to the peripheral through plugs, and at least one dummy through plug adjacent to a first peripheral through plug of the peripheral through plugs, the at least one dummy through plug penetrating the planarized dielectric layer and being insulated from the conductive lines.

Three-dimensional semiconductor memory device

Growing community of inventors

Hwaseong-si, South Korea

Gaeun Kim