Shizuoka University

Sii Nanotechnology Inc.

Futoshi Iwata

Masatoshi Yasutake

Osamu Takaoka

Koji Suzuki

Toshio Shiomi

Takuya Nakaue

Syuichi Kikuchi

A contact state detection apparatus which can accurately detect the pressed state of a contact body such as a probe against an object without damaging the contact body or the object includes a contact body approach section, a probe light source, an imaging device, and a computer unit. The contact body approach section holds a contact body in an inclined attitude with respect to a target contact surface of an object, and displaces the contact body toward the object. The probe light source irradiates light toward the contact body which is being displaced toward the object. The imaging device captures an image of the illuminated contact body and outputs contact body captured image information to the computer unit. The computer unit detects the state of the contact body being pressed against the object based on a change in the contact body captured image information.

Contact state detection apparatus

There is a micro-machining apparatus for removing the micro-machining dust generated at the time of machining while a workpiece M is machined within a liquid W using a probe tip. The apparatus includes a stage on which the workpiece is to be placed; a probe having the probe tip, a machining device having a moving means that moves the stage and the probe relative to each other to machine the workpiece by the probe tip, and a micro-machining dust removing device having a first electrode and a second electrode that are arranged in the liquid so as to sandwich the probe tip therebetween, and a voltage application means that applies a voltage to between both the electrodes to move the micro-machining dust in the liquid.

Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method

Growing community of inventors

Shizuoka, Japan

Futoshi Iwata