Sony Corporation

Futoshi Hiei

Satoshi Ito

Atsushi Toda

Akira Ishibashi

Norikazu Nakayama

Takao Miyajima

Masafumi Ozawa

Katsuhiro Akimoto

Tsuyoshi Tojyo

Tatsushi Nashida

Hiroyuki Okuyama

Masao Ikeda

Satoru Matsuda

Kazushi Nakano

Toyoharu Ohata

Yuko Morinaga

Yoshino Iochi

Akira Ishibash

To allow a user to quickly and surely recognize whether an object is chat-enabled or not. A pointer is displayed on a three-dimensional virtual reality space image and, when the pointer is placed onto any of objects displayed in the three-dimensional virtual reality space image to specify the pointed object, it is determined whether that object is chat-enable based on the attribute information thereof. If the object is found chat-enabled, the pointer having a normal shape of an arrow is changed to a pointer 201a having a shape resembling a human face. This novel constitution allows a user to intuitively understand whether each of the objects displayed in the three-dimensional virtual reality space is chat-enabled or not.

Three-dimensional virtual reality space display processing apparatus, a

A semiconductor device having an ohmic electrode having a satisfactory ohmic contact to an n-type GaAs can be obtained by heat treatment at low temperature. A method of manufacturing the semiconductor device having the ohmic electrode includes two processes. In the first process, a metal layer containing Ni, Sn and AuGe is formed on one main surface of the n-type GaAs. In the second process, the n-type GaAs is subjected to a heat treatment at a temperature which is equal to or higher than 190 C. and equal to or lower than 300 C. Thus, the ohmic electrode is formed on the one main surface of the n-type GaAs.

Method of manufacturing a semiconductor device having ohmic electrode

A semiconductor device having an ohmic electrode having a satisfactory ohmic contact to an n-type GaAs can be obtained by heat treatment at low temperature. A method of manufacturing the semiconductor device having the ohmic electrode includes two processes. In the first process, a metal layer containing Ni, Sn and AuGe is formed on one main surface of the n-type GaAs. In the second process, the n-type GaAs is subjected to a heat treatment at a temperature which is equal to or higher than 190.degree. C. and equal to or lower than 300.degree. C. Thus, the ohmic electrode is formed on the one main surface of the n-type GaAs.

Semiconductor device having ohmic electrode and method of manufacturing

A light emitting device and a method of fabricating the same in which a first cladding layer is formed on a substrate, then red, green and blue light emitting portions each made of II-VI semiconductor are formed in a horizontal direction with respect to a surface of the substrate on the first cladding layer, then a second cladding layer is formed on the light emitting portions, and the red, green and blue light emitting portions are electrically separated from each other so that three primary color light emitting portions of a self luminous type are formed on the same substrate through single crystal growth process by changing composition of a compound semiconductor layer.

Semiconductor display device and a method of fabricating the same

A semiconductor laser using a II-VI compound semiconductor as the material for cladding layers, capable of emitting a blue to green light is disclosed. In an aspect of the semiconductor laser, an n-type ZnSe buffer layer, an n-type ZnMgSSe cladding layer, an active layer made of, for example, ZnCdSe, a p-type ZnMgSSe cladding layer and a p-type ZnSe contact layer are stacked in sequence on an n-type GaAs substrate. A p-side electrode such as an Au/Pd electrode is provided in contact with the p-type ZnSe contact layer. An n-side electrode such as an In electrode is provided on the back surface of the n-type GaAs substrate. In another aspect of the semiconductor laser, an n-type optical guiding layer made of ZnSSe, ZnMgSSe or ZnSe is provided between the n-type ZnMgSSe cladding layer and the active layer, and a p-type optical guiding layer made of ZnSSe, ZnMgSSe or ZnSe is provided between the p-type ZnMgSSe cladding layer and the active layer.

Semiconductor laser with ZnMgSSe cladding layers

A semiconductor laser capable of emitting blue or green light is disclosed. The semiconductor laser comprises an n-type ZnMgSSe cladding layer, an active layer, a p-type ZnMgSSe cladding layer, a p-type ZnSe contact layer and a p-type ZnTe contact layer which are stacked in this sequence on an n-type GaAs substrate. A p-side electrode is provided on the p-type ZnTe contact layer. An n-side electrode is provided on the back surface of the n-type GaAs substrate. A multiquantum well layer comprising quantum wells made of p-type ZnTe and barriers made of p-type ZnSe is provided in the depletion layer produced in the p-type ZnSe contact layer along the junction interface between the p-type ZnSe contact layer and the p-type ZnTe contact layer. Holes injected from the p-side electrode pass through the junction by the resonant tunneling effect through quantum levels formed in the quantum wells of the multiquantum well layer.

Semiconductor metal contacting structure and a light emitting device

Semiconductor display device with red, green and blue emission

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Kanagawa, Japan

Futoshi Hiei