Shanghai Micro Electronics Equipment (Group) Co., Ltd.

Shanghai Micro Electronics Equipment Co., Ltd.

Fuping Zhang

Yanfei Wang

Zhiyong Jiang

Xiang Jia

Menglai Chen

A shutter device includes a light blocking unit and a voice coil motor. The voice coil motor includes a permanent magnet module, a guide track assembly and a coil assembly. The coil assembly is arranged on the guide track assembly, and the permanent magnet module is adapted to produce a magnetic field in the guide track assembly. The light blocking unit includes two shutter blades both connecting to the coil assembly. When energized, the coil assembly will produce a magnetic field having a direction same as or opposite to the direction of the magnetic field in the guide track assembly so that the coil assembly moves forward or backward along the guide track assembly to drive the two shutter blades to open or close. A method controls the shutter device. An exposure dose control method is used with a photolithography machine including the shutter device.

Shutter device, method of controlling same, photolithography machine, and method of controlling exposure dose thereof

A shutter device includes a movable shading module and a movement control module configured to control movement of the movable shading module. The movable shading module includes a shading unit, a driving unit and a signal measuring unit. The shading unit includes two blades, and the movement control module is configured to generate a control signal. The driving unit is configured to receive the control signal and drive the two blades. The signal measuring unit is configured to measure an operating status of the blades feed it back to the movement control module in real time. The movement control module is configured to update the control signal based on the fed back operating status. This shutter device can overcome the problems of low exposure dose accuracy and light leaks arising from the use of existing shutters and provide various accurately-controlled exposure doses suitable for different applications.

Shutter device

A shutter device for use in exposure by a photolithography machine and a method of using the shutter device are disclosed. The device includes a shutter blade (); a rotating motor () for driving the shutter blade () to rotate; a controller in electric connection with the rotating motor (); and a supporter () for supporting the rotating motor (). The shutter blade () includes a rotation center () and, disposed in correspondence with the rotation center (), at least one open portion () and at least one shielding portion (). The rotation center () is coupled to the rotating motor () which drives the shutter blade () to rotate so that the shutter device opening and closure are accomplished to enable and disable exposure. The shielding portion () includes a hollow portion () which significantly reduces the mass of the shutter blade (), thereby facilitating the control over the rotation of the shutter blade (). Under the control of the controller, the opening and closing of the shutter is accomplished during rotation of the shutter blade () at a constant speed, while the acceleration and deceleration of the shutter blade () take place in the period when the shutter device is in a closed state, which is relatively long and allows a large stroke. This significantly reduces the required torque of the rotating motor () and effectively shortens the shutter opening and closing time.

Growing community of inventors

Shanghai, China

Fuping Zhang