Central Glass Company, Limited

Fumito Kobayashi

Haruhiko Komoriya

Yoshiharu Terui

Yukari Hara

Ikunari Hara

A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), Rrepresents a C-Cstraight, C-Cbranched or C-Ccyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Composition for forming films, film produced from said composition, and method for producing organic semiconductor element using said composition

A film-forming composition according to the present invention include fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), Reach independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and Reach independently represents C-Cstraight, C-Cbranched or C-Ccyclic fluorine-containing hydrocarbon gr which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

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Matsusaka, Japan

Fumito Kobayashi