Canon Kabushiki Kaisha

Fumitaro Masaki

Akira Miyake

Naoya Iizuka

Yusuke Tanaka

Kazuhiko Fukutani

Jun Ito

Nobuhito Suehira

Kiyoshi Takagi

Mitsuaki Amemiya

Hajime Kanazawa

Takuro Miyasato

Robert A Kruger

A control apparatus for a continuum robot including a curved portion that is curved by driving a wire with a driving mechanism includes an image DB/torsional-amount acquisition unit that obtains the torsional amount of the continuum robot and a kinematic operation unit that sets the driving displacement amount of the wire driven by the driving mechanism on the basis of the torsional amount obtained by the image DB/torsional-amount acquisition unit.

Apparatus and method for controlling continuum robot, and computer-readable storage medium

An ultrasonic apparatus includes an ultrasonic wave generating member having a light absorbing member that generates an ultrasonic wave when irradiated by a light from a light irradiating portion, and a transducer that detects the ultrasonic wave and converts the ultrasonic wave into an electric signal. The ultrasonic wave generating member includes an area that has a different light absorption coefficient in an irradiation area irradiated by the light from the light irradiating portion. Furthermore, in an area in which the light absorbing member is disposed, when an area irradiated by the light from the light irradiating portion is referred to as a transmitted ultrasonic wave generating area, the transmitted ultrasonic wave generating area functions as a surface sound source.

Ultrasonic apparatus

A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method

An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.

X-ray apparatus and its adjusting method

A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.

Filter, exposure apparatus, and method of manufacturing device

An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-tooth shape formed by one-dimensionally arranging a plurality of grating elements, wherein the blazed grating is configured to exert a first power on the light having the first wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing angles surfaces of the plurality of grating elements make with a base plane, and to exert a second power on the light having the second wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing lengths of the plurality of grating elements along a direction in which the plurality of grating elements are arranged.

Optical device and device manufacturing method

A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.

Multilayer mirror, evaluation method, exposure apparatus, device manufacturing method

An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.

X-ray generator and exposure apparatus

A measuring apparatus for measuring a spectrum of extreme ultraviolet light that diverges from a divergent center point of an extreme ultraviolet light source, includes a spectrum measuring unit that includes a spectrometer and a detector that has a spatial resolution in a spectrum forming direction of the spectrometer, and a drive mechanism that makes the spectrum measuring unit movable relative to the divergent center point.

EUV light spectrum measuring apparatus and calculating method of EUV light intensity

A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that attaches to at least one of the first and second optical systems by changing an irradiation condition of the laser differently from that used to generate the plasma.

Light generator and exposure apparatus

A method for adjusting an optical system that has a multilayer mirror that includes a multilayer film includes the steps of measuring wave front aberration of the optical system, determining a condition to remove part of the multilayer film in the multilayer mirror so that the wave front aberration measured in the measuring step may reduce, and removing the part of the multilayer film in the multilayer mirror based on the condition determined by the determining step.

Adjustment method and apparatus of optical system, and exposure apparatus

The present invention provides a measuring device by which, even if a radiation intensity from a light source, a beam size or a beam intensity distribution of the light source changes, an optical characteristic of an optical element to be measured can be measured very precisely. In a measuring device according to the present invention, to this end, light from a light source is diffracted by a diffracting grating to thereby resolve the same into plural light beams, and by using different light beams, the object to be measured is measured and the intensity of incident light from the light source is measured. With this structure, even if the light from the light source changes, the intensity of the light from the light source is specified concurrently, and therefore, the optical characteristic of the object to be measured can be measured very accurately.

Optical measuring device

An optical apparatus that measures a polarization dependent characteristic of a measured object includes a light source for emitting non-linearly polarized light in an extreme ultraviolet region or an X-ray region, and a rotary polarizer for reflecting the light emitted from the light source, the polarizer including a set of mirrors repeating three or more reflections and being arranged such that an optical axis of incident light and that of outgoing light are aligned with the same straight line.

Optical apparatus

A mirror device having an optical system of an exposure apparatus for transferring a reticle pattern onto a wafer includes a mirror, a mirror holding portion, a temperature adjustment unit, a control management database, and a timing control unit. The mirror reflects exposure light, and the mirror holding portion holds the mirror. The temperature adjustment unit adjusts a temperature of the mirror and the mirror holding portion. The control management database stores data corresponding to a controlling rule of the temperature adjustment unit necessary to keep the mirror figure constant for an incidence condition of the reflected exposure light. The timing control unit controls the temperature adjustment unit corresponding to the incidence condition of the exposure light. The timing control unit controls the temperature adjustment unit based on the stored data of the control management database to keep the mirror figure constant.

Growing community of inventors

Utsunomiya, Japan

Fumitaro Masaki