Hitachi, Ltd.

Fumio Shibata

Katsuaki Nagatomo

Norio Nakazato

Yutaka Kakehi

Masato Kobayashi

Tsunehiko Tsubone

Tooru Tanimizu

Yoshimasa Fukushima

Kiyoshi Fujiwara

Shoji Yoshinaga

Masayoshi Hayakawa

Takeshi Harada

Sadayuki Okudaira

Noriaki Yamamoto

Makoto Nawata

Yasuomi Yagi

Zensuke Tamura

Takanobu Mori

Satoru Kajiwara

Hiroshi Kanekiyo

Yutaka Omoto

Norio Kanai

Kado Miyakawa

Hironobu Ueda

Gen Marumoto

Ryoji Fukuyama

Shoji Nomura

Masatoshi Morita

Kousai Hiratsuka

Hidetomo Fukuhara

Ayunu Morita

In an insulated type switching device, during rotation of a movable conductor around a pivotal axis between a stationary conductor and a ground conductor all of which are disposed in a vacuum vessel the movable conductor uninterruptedly takes four positions of closing position Y , opening position Y , disconnecting position Y and grounding position Y , thereby a series of switching operations can be performed uninterruptedly, the operation and handling thereof are facilitated as well as the size of the insulated type switching device is reduced.

Insulated type switching device

In an insulated type switching device, during rotation of a movable conductor 19 around a pivotal axis 35 between a stationary conductor 16 and a ground conductor 17 all of which are disposed in a vacuum vessel 12, the movable conductor 19 uninterruptedly takes four positions of closing position Y.sub.1, opening position Y.sub.2, disconnecting position Y.sub.3 and grounding position Y.sub.4, thereby a series of switching operations can be performed uninterruptedly, the operation and handling thereof are facilitated as well as the size of the insulated type switching device is reduced.

The rotor for a dynamo electric machine serving as a synchronous generator as well as being designed operable as a variable speed motor for starting a prime mover for the synchronous generator, the rotor (1) comprising a rotor core (2), a plurality of slots (4) disposed around the circumference of the rotor core (2) and extending along the axial direction of the rotor core (2), rotor windings (3) being accommodated in the slots (4) and wedges (6) being accommodated in the slots (4) over the rotor windings (3) near at the surface of the rotor core (2) for preventing the rotor windings (3) from being pushed out due to a centrifugal force caused by rotation of the rotor (1), wherein wedges (6) where an eddy current flows are formed by Cu-0.05.about.4 wt % Zr-0.3.about.5 wt % Ni-0.2.about.1.5 wt % Si having a 0.2% proof stress equal to or more than about 20 Kg/mm.sup.2 and an electrical conductivity equal to or more than about 20% IACS (International Annealed Copper Standard), whereby damages of the rotor elements due to electrolytic corrosion are prevented.

Rotor for dynamo electric machine

A vacuum processing unit and apparatus comprises a buffer chamber that can be evacuated, a processing chamber that can be communicated with said buffer chamber a first sample carrier installed in said buffer chamber, a vacuum opening/closing device provided in the buffer chamber to correspond to the first sample carrier, a vacuum prechamber provided for the buffer chamber via the vacuum opening/closing device, a second sample carrier which carries the sample between the vacuum prechamber and the first sample carrier via the vacuum opening/closing device, and a third sample carrier which carries the sample between said first sample carrier and the processing chamber. The vacuum processing units can be connected in groups via vacuum opening/closing devices provided for the buffer chambers in locations corresponding to the end of the first sample carriers therein. The number of connected processing chambers can be freely changed to meet a change in the process or the manufacturing line.

Vacuum processing unit and apparatus

The present invention relates to a plasma processor, and the plasma processor comprises a processing chamber, means to reduce a pressure in the processing chamber so as to evacuate the interior thereof, means to introduce a processing gas into the processing chamber, means to generate an electric field within the processing chamber, and means to establish a magnetic field orthogonal to the electric field, this means being rotatable relative to a surface to-be-processed of a sample which is processed in a plasma arising under the action of the electric field and the magnetic field, whereby a space required for the movement of the means to establish the magnetic field orthogonal to the electric field can be reduced to miniaturize the processor, and the uniform processing of the sample can be attained using rotatable plasma.

Plasma processor

This invention relates to a method and apparatus for controlling temperature of a sample and is intended to prevent a sample from being deformed by the pressure of a heat transmission gas by mounting and fixing the sample being mounted and processed in a vacuum on and to the sample stand and supplying the heat transmission gas to the gap between the under surface of the sample thus fixed and the sample stand; effectively control the temperature of the sample being processed in a vacuum by limiting the size of the gap between the under surface of the sample and the sample stand; and make the heat transmission gas least affect the process by limiting the flow of the heat transmission gas in the vacuum process chamber.

Method and apparatus for controlling sample temperature

The invention relates to a method and apparatus for a plasma process in which identical samples are processed in a plasma-processing apparatus provided with a radio-frequency plasma generation means and a microwave plasma generation means, by the utilization of a radio-frequency plasma in the radio-frequency plasma generation means and a microwave plasma in the microwave plasma generation means. The plasma-processing rate can thus be increased, and also electrical damage due to ions in the plasma can be reduced, thereby ensuring a high throughput and a high quality during the manufacture of semiconductor integrated circuit elements.

Method and apparatus for plasma process

Desalting method of fuel oil

A centrifugal type counterflow contact apparatus having a rotary body or drum intergrally mounted on a rotary shaft, and a plurality of ring members disposed within the rotary body such that circumferential slits are defined between the adjacent ring members in the axial direction of the rotary drum. The ring members have a cross sectional configuration inclined with respect to the axis of the rotary body. A light liquid is introduced into the periphery of the rotary body while a heavy liquid is introduced in the center portion of the rotary body. The heavy and light liquids flow countercurrently through the slits between the ring members under the centrifugal force produced by the rotation of the rotary body, whereby extractability can be improved and accumulation of solids entrained in the feed can be avoided.

Centrifugal type counterflow contact apparatus

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Kudamatsu, Japan

Fumio Shibata