Gigaphoton Inc.

Arms Komatsu Ltd.

Fumika Yoshida

Osamu Wakabayashi

Kouji Kakizaki

Shinji Nagai

Takayuki Yabu

Takeshi Asayama

Yasuo Itakura

A degree of polarization control device includes:

Polarization purity control device and gas laser apparatus provided with the same

A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window () and a second window () of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a &#x3c;111&#x3e; axis and a &#x3c;001&#x3e; axis of each of the first window () and the second window () as seen from inside the chamber (), the first window () and the second window () are arranged in positions rotated in the same direction by the same angle about their &#x3c;111&#x3e; axis.

Gas discharge chamber

An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material. A target generating unitinjects molten tin in a droplet shape as a targetinto a chamber. A protective coating provided with an erosion resistance property to tin is configured on a section that comes into contact with tin in a molten state for each face of a nozzle partand a tank part. Alternatively, a part that comes into contact with tin in a molten state is made of a material provided with an erosion resistance property and a heat resistance property.

Extreme ultraviolet light source device

A casing for a laser device in which contaminants do not generate even if it is radiated with laser light, a production method and a cleaning method of the same are provided. For this purpose, the cleaning method is a method of cleaning a casing ( ) for an ultraviolet laser device, an inside of which laser light ( ) passes through, comprises the steps of purging the inside of the casing ( ) with an inert gas, and radiating F2 cleaning laser light ( ) oscillated from an F2 molecular laser light radiating device ( ) to the inside of the casing ( ) to thereby remove contaminants adhering to the inside of the casing ( ).

Growing community of inventors

Hiratsuka, Japan

Fumika Yoshida