Tokyo Electron Limited

Fumihiko Ikeda

Toshifumi Inamasu

Yoshitaka Otsuka

Koutarou Onoue

Kenya Shinozaki

Hikaru Kubota

A coating processing apparatus that applies a coating liquid containing an optical material includes a substrate holder that holds a substrate, a coating nozzle that ejects the coating liquid to the substrate held by the substrate holder, and a moving mechanism that relatively moves the substrate holder and the coating nozzle in an orthogonal direction.

Coating processing apparatus, coating processing method, and storage medium

A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

Local exposure method and local exposure apparatus

Jet lines C, C, C, . . . extending in an X-direction and suction lines C, C, C, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openingsare arranged at fixed intervals 3D on the jet lines C, suction openingsare arranged at fixed intervals 3D on the suction lines C, and the jet openingsand the suction openingson the adjacent ones of the jet lines Cand the suction lines Care spaced apart from each other by a fixed distance D with respect to the X-direction. Slotsandare extended straight from the upper ends of the jet openingsand the upper ends of the suction openings, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.

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Kumamoto, Japan

Fumihiko Ikeda