Asahi Glass Company, Limited

Fumiaki Gunji

Takashige Yoneda

Takeshi Morimoto

Tadashi Hamano

Yukiko Ono

Takeshi Kawasato

Kazuya Hiratsuka

Kazuo Sato

Hiroyuki Fujita

Kenji Ishizeki

Yasuo Hayashi

Tsuneo Wakabayashi

Satoshi Takeda

Makoto Fukawa

Hiromichi Nishimura

Surface treatment composition, method of surface treatment, substrate and article

Fluorine-containing organic silicon compound, water repellent composition containing it, and surface-treated substrate and process for its production

A substrate having at least two treated surface layers, wherein the first layer constituting the outermost layer among the treated surface layers is a layer formed by covering with a composition containing a reactive silane compound (I) which forms a surface having a rolling angle of at most 30&deg; to water, and the second layer constituting an underlayer in contact with the first layer is a layer formed by covering with a composition (II) containing a fluorine-containing reactive silane compound (II) which forms a surface having a contact angle of at least 100&deg; to water.

Substrate having treated surface layers and process for producing it

A substrate having at least two treated surface layers, wherein the first layer constituting the outermost layer among the treated surface layers is a layer formed by covering with a composition (I) containing a predetermined organic silicon compound, and the second layer constituting an underlayer in contact with the first layer is a layer formed by covering with a composition (II) containing a fluorine-containing reactive silane compound (II) which forms a surface having a contact angle of at least 100&deg; to water.

A composition for surface treatment, which comprises a compound of the following formula (A) and an organic solvent (B) comprising an organic compound having a fluorine atom:

Composition for surface treatment

A laminate comprising a substrate and at least one layer formed on the substrate, in which the outermost layer as a surface layer has a plurality of micropores therein and, at its surface, a flat portion and fine craters, said flat portion having a surface roughness R.sub.a of at most 3 nm and an area ratio of at least 20%.

Laminate and process for its production

A surface-treated substrate which is a substrate having at least two treated surface layers, wherein the first layer constituting the outermost layer among the treated surface layers is a layer formed by treatment with a surface treating agent containing compound B of the formula (B) as an essential component, and the second layer constituting an underlayer in contact with the outermost layer is a layer formed by treatment with a surface treating agent containing compound A of the formula (A) and Si(NCO).sub.4 as essential components:

Surface-treated substrate and process for its production

A composition for surface treatment, which comprises the following components (I), (II) and (III) as essential components:

A surface treating agent containing a silicone compound of the formula (A):

Surface treating agent and surface-treated substrate

A surface-treated substrate consisting essentially of a substrate having at least two treated surface layers wherein the first layer constituting the outermost layer among the treated surface layers is a layer formed by treating with a treating agent containing a compound (I) capable of forming a surface having a contact angle of at least 70.degree. against water, and the second layer constituting an underlayer in contact with the outermost layer is a thin film layer of a heat resistant polymer formed by treating with a treating agent containing a compound (II) capable of forming a thin film of a heat resistant polymer and fine particles of a polymer, to form a thin film and heating the thin film to thermally decompose the fine particles of a polymer.

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Yokohama, Japan

Fumiaki Gunji