Taiwan Semiconductor Manufacturing Comp. Ltd.

Fu-Wei Liu

Mirng-Ji Lii

Wen-Hsiung Lu

Ting-Li Yang

Lung-Kai Mao

A method for forming a semiconductor device structure is provided. The method includes providing a chip structure including a substrate and a wiring structure over a first surface of the substrate. The method includes removing a first portion of the wiring structure adjacent to the hole to widen a second portion of the hole in the wiring structure. The second portion has a first width increasing in a first direction away from the substrate. The method includes forming a first seed layer over the wiring structure and in the hole. The method includes thinning the substrate from a second surface of the substrate until the first seed layer in the hole is exposed. The method includes forming a second seed layer over the second surface of the substrate and the first seed layer in the hole.

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Tainan, Taiwan

Fu-Wei Liu