Taiwan Semiconductor Manufacturing Comp. Ltd.

Fu-Sheng Chu

Yu-Po Tang

Chih-Shiang Chou

Yan-Ying He

Yuan-Chih Chu

Hsin-Chang Lee

Ta-Cheng Lien

Chi-Lun Lu

Ya-Ting Chang

Ping-Hsun Lin

Wei-Che Hsieh

A reflective mask includes a substrate, a lower reflective multilayer disposed over the substrate, an intermediate layer disposed over the lower reflective multilayer, an upper reflective multilayer disposed over the intermediate layer, a capping layer disposed over the upper reflective multilayer, and an absorber layer disposed in a trench formed in the upper reflective layers and over the intermediate layer. The intermediate layer includes a metal other than Cr, Ru, Si, Si compound and carbon.

EUV photo masks and manufacturing method thereof

A microscope apparatus includes light source configured to generate an illuminating beam. The microscope apparatus further includes a first beam splitter configured to split the illuminating beam into a first component along a first path and a second component along a second path. The microscope apparatus further includes a movable reflector module along the second path. The microscope apparatus further includes a moving mechanism connected to the movable reflector module, wherein the moving mechanism is configured to move the movable reflector in a first direction for adjusting a length of the second path. The microscope apparatus further includes a second beam splitter configured to recombine the first component and the second component. The microscope apparatus further includes an observing device configured to receive the recombined first component and second component.

Microscope apparatus

A microscope apparatus including an electromagnetic wave source configured to generate an illuminating electromagnetic wave. The microscope apparatus includes a first beam splitter configured to split the illuminating electromagnetic wave into a first component along a first path and a second component along a second path. The microscope apparatus includes a movable reflector module configured to adjust the second path. The microscope apparatus includes a second beam splitter configured to recombine the first component and the second component. The microscope apparatus includes an observing device arranged along the first path and configured to receive the recombined first component and second component. The microscope apparatus is configured to acquire, from the observing device, a phase image based on positioning of the movable reflector module and representative of an electric field distribution near an object located along the first path between the first beam splitter and the second beam splitter.

A microscope apparatus includes an electromagnetic wave source configured to generate an illuminating electromagnetic wave, a first beam splitter configured to split the illuminating electromagnetic wave into a first component along a first path and a second component along a second path, a movable reflector module configured to adjust a portion of the second path, and a second beam splitter configured to recombine the first component and the second component. An observing device is configured to receive the recombined first component and second component and the microscope apparatus is configured acquire a phase image from the observing device based on positioning of the movable reflector module and representative of an electric field distribution near an object located along the first path between the first beam splitter and the second beam splitter.

Microscope apparatus and method for phase image acquisition

The present disclosure provides a method of repairing a mask. The method includes inspecting the mask using a mask inspection tool to identify a defect on a circuit pattern of the mask; repairing the defect using a mask repair tool to form a repaired pattern; forming a first group of diffraction images of the repaired pattern and a second group of diffraction images of a reference feature; and validating the mask by comparing the first group of diffraction images with the second group of diffraction images.

Method of repairing a mask

Method for repairing a mask

A microscope apparatus includes a condenser lens to make an illuminating electromagnetic wave relatively homogeneous, a first beam splitter splitting the illuminating electromagnetic wave after the condenser lens, a movable reflector module, a second beam splitter, an objective lens to project the illuminating electromagnetic wave propagating after an object to be observed toward an observing device. The object is loaded between the first beam splitter and the second beam splitter. The microscope apparatus is configured to split the illuminating electromagnetic wave into two paths at the first beam splitter. A first path goes through the first and the second beam splitters, and a second path goes through the movable reflector module to rejoin the first path at the second beam splitter. The microscope apparatus is configured acquire phase images with interferences of the electromagnetic wave from the two paths with at least two distance settings of the movable reflector module.

Microscope apparatus for phase image acquisition

Integrated circuit (IC) methods for optical proximity correction (OPC) modeling and mask repair are described. The methods include use of an optical model that generates a simulated aerial image from an actual aerial image obtained in an optical microscope system. In the OPC modeling methods, OPC according to stage modeling is simulated, and OPC features may be added to a design layout according to the simulating OPC. In the mask repair methods, inverse image rendering is performed on the actual aerial image and diffraction image by applying an optical model that divides an incoherent exposure source into a plurality of coherent sources.

Growing community of inventors

Zhubei, Taiwan

Fu-Sheng Chu