Taiwan Semiconductor Manufacturing Comp. Ltd.

Fu-Hsiung Yang

Kun-Ming Huang

Long-Shih Lin

Po-Tao Chu

Ming-Yi Lin

Chih-Heng Shen

Kong-Beng Thei

Paul Chu

Cheng-Chi Chuang

Tsung-Chieh Tsai

Ta-Wei Lin

Jung-Hui Kao

Li-Hsuan Yeh

Jing-Jung Huang

Yu-Lun Lu

Chao-Wei Tseng

Ching-Hsun Hsu

A plurality of devices for testing, connected in series using one or more redistribution layers (RDLs), are used to perform a semiconductor device test on a plurality of dies. As a result, the semiconductor device test may support thousands of gross dies per wafer or greater (e.g., 10,000 dies or greater). Furthermore, the RDL(s) may be removed after use. In some implementations, the devices for testing corresponding to the dies may execute the semiconductor device test sequentially. Accordingly, test data may be generated and may include a bit sequence, where a first bit in the bit sequence indicates an overall outcome for the test and one or more subsequent bits in the bit sequence indicate respective outcomes for each semiconductor dies or for each line of the semiconductor device test.

Semiconductor testing device and method of operating the same

A semiconductor structure is provided. The semiconductor structure includes a substrate, a diode region, and a dummy stripe. The substrate has a first surface. The diode region is in the substrate. The diode region includes a first implant region of a first conductivity type approximate to the first surface, and a second implant region of a second conductivity type approximate to the first surface and surrounded by the first implant region. The dummy stripe is on the first surface and located between the first implant region and the second implant region. A method for manufacturing a semiconductor structure is also provided.

Semiconductor structure and method for manufacturing thereof

A bipolar transistor includes a substrate having a first well with a first dopant type; and a split collector region in the substrate, the split collector region including a highly doped central region having the first dopant type, and a lightly doped peripheral region having a second dopant type, opposite the first dopant type, wherein the lightly doped peripheral region surrounds the highly doped central region, a dopant concentration of the lightly doped peripheral region ranges from about 5&#xd7;10ions/cmto about 5&#xd7;10ions/cm, and the lightly doped peripheral region has a same maximum depth as the highly doped central region.

Method of making bipolar transistor

A method of making a bipolar transistor includes patterning a first photoresist over a collector region of the bipolar transistor, the first photoresist defining a first opening. The method further includes performing a first implantation process through the first opening. The method further includes patterning a second photoresist over the collector region, the second photoresist defining a second opening different from the first opening. The method further includes performing a second implantation process through the second opening, wherein a dopant concentration resulting from the second implantation process is different from a dopant concentration resulting from the first implantation process.

A substrate for an integrated circuit includes a device wafer having a raw carrier concentration and an epitaxial layer disposed over the device wafer. The epitaxial layer has a first carrier concentration. The first carrier concentration is higher than the raw carrier concentration.

Method for forming a multiple layer epitaxial layer on a wafer

Some embodiments of the present disclosure relate to a method to increase breakdown voltage of a power device. A power device is formed on a silicon-on-insulator (SOI) wafer made up of a device wafer, a handle wafer, and an intermediate oxide layer. A recess is formed in a lower surface of the handle wafer to define a recessed region of the handle wafer. The recessed region of the handle wafer has a first handle wafer thickness, which is greater than zero. An un-recessed region of the handle wafer has a second handle wafer thickness, which is greater than the first handle wafer thickness. The first handle wafer thickness of the recessed region provides a breakdown voltage improvement for the power device.

Partial SOI on power device for breakdown voltage improvement

A bipolar transistor includes a substrate and a first well in the substrate, the first well having a first dopant type. The bipolar transistor further includes a split collector region in the first well. The split collector region includes a highly doped central region having a second dopant type opposite the first dopant type; and a lightly doped peripheral region having the second dopant type, the lightly doped peripheral region surrounding the highly doped central region. A dopant concentration of the lightly doped peripheral region is less than a dopant concentration of the highly doped central region.

Bipolar transistor structure having split collector region and method of making the same

Multiple layer substrate

The present disclosure relates to a method and apparatus to increase breakdown voltage of a semiconductor power device. A bonded wafer is formed by bonding a device wafer to a handle wafer with an intermediate oxide layer. The device wafer is thinned substantially from its original thickness. A power device is formed within the device wafer through a semiconductor fabrication process. The handle wafer is patterned to remove section of the handle wafer below the power device, resulting in a breakdown voltage improvement for the power device as well as a uniform electrostatic potential under reverse biasing conditions of the power device, wherein the breakdown voltage is determined. Other methods and structures are also disclosed.

A high voltage MOS transistor comprises a first drain/source region formed over a substrate, a second drain/source region formed over the substrate and a first metal layer formed over the substrate. The first metal layer comprises a first conductor coupled to the first drain/source region through a first metal plug, a second conductor coupled to the second drain/source region through a second metal plug and a plurality of floating metal rings formed between the first conductor and the second conductor. The floating metal rings help to improve the breakdown voltage of the high voltage MOS transistor.

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Zhongli, Taiwan

Fu-Hsiung Yang