Angewandte Solarenergie-ase Gmbh

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Fritz Heyer

Hilmar Von Campe

Berthold Schum

Peter Roth

Axel Metz

Gernot Wandel

Jens Dirk Moschner

Yvonne Gassenbauer

Raimund DRÖSSLER

A process and device for treating sheet objects, especially fragile sheet objects, by rotation through a liquid bath. The objects are disposed in radial slots in a rotating disk, retained therein by a flexible element moving synchronously with the disk, and by a retaining element mounted adjacent the disk and spaced therefrom along its axis of rotation.

Process and device for treatment of sheet objects in a liquid bath

The invention relates to a process for heat treatment of two-dimensional objects such as semiconductor wafers, for example in the form of silicon wafers, where the objects are arranged on supports and are conveyed through a heating unit, in particular continuously. To achieve a targeted treatment of a two-dimensional object, in particular of a semiconductor component such as a silicon wafer, on one side only, while at the same time achieving a high throughput with incorporation as necessary into a continuous overall manufacturing process, it is proposed that the objects be arranged in full surface contact with the supports, which cover the objects completely or almost completely on their underside and which in turn comprise quartz glass in particular.

Process and arrangement for heat treatment of two-dimensional objects

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Wedel, Germany

Fritz Heyer