Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Frits Jurgen Van Hout

Johannes Jacobus Matheus Baselmans

Peter Dirksen

Christian Wagner

Mark Kroon

Casparus Anthonius Henricus Juffermans

Ingrid Minnaert-Janssen

Peter Van Oorschot

Adriaan Roelof Van Zwol

Roderik Willem Van Es

Petrus Augustinus Marie Van Der Wielen

Josephus Antonius Maria Van Bommel

Hubrecht Lodewijk Van Ginneken

Renatus Maria Adrianus Mathias Van Den Eijnden

A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.

Sensor for lithographic apparatus and method of obtaining measurements of lithographic apparatus

To reduce and prevent local field anomalies created localized thinning of the coating of optical elements in the apparatus. The projection system is flood exposed to an intense beam of radiation for a substantial period of time. As the rate of thinning of the coating decreases with time, a uniform coating results.

Method of and preventing focal plane anomalies in the focal plane of a projection system

Growing community of inventors

Retie, Belgium

Frits Jurgen Van Hout