Altera Corporation

Fredrik Haghverdian

Yaron Kretchmer

Electrical interconnects with a slotting pattern are provided in the present invention. In addition, the masks for making such interconnects and semiconductor devices incorporating such interconnects are also provided in the present invention. The slotting pattern may be designed to minimize dishing effects of the interconnects as a result of planarization. Further, the slotting pattern may be designed to minimize resistance in the interconnects. For instance, the slotting pattern may include slots that are staggered, evenly aligned, or a combination of both staggered and evenly aligned. In addition, the slots may be spaced apart such that electrical paths are shorter across the interconnects. By incorporating such interconnects in semiconductor devices, better performing semiconductor devices can be realized.

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Sunnyvale, CA, United States of America

Fredrik Haghverdian