Mycronic Ab

Fredric Ihren

Anders Svensson

Robert Eklund

Jan Sterner

Martin Glimtoft

Pontus Stenstrom

A method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure includes: decreasing a relative laser intensity of each pixel from a respective first relative laser intensity to a respective second relative laser intensity, adjusting a laser dose translation of relative laser intensity of pixels from a first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity, such that a respective effective exposed laser dose of each pixel achieved by the second laser dose translation is equal to a respective effective exposed laser dose of each pixel that would have resulted from the first laser dose translation, and increasing, by a constant additive term, the respective relative laser intensity of an edge pixel or of a neighbouring pixel from the respective second relative laser intensity to a respective third relative laser intensity.

Device and method for setting relative laser intensities

A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S) of an original pattern, having a periodicity. A first pattern main period is determined (S). Image area and a first pitch of imaged elements are obtained (S). The original pattern is scaled (S) by a first raster scaling factor. The scaled pattern is cropped (S) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.

Method and device for pattern generation

A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S). Deviations of the measured positions relative calibration pattern are calculated (S). Each deviation is associated (S) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.

Beam position image optimization

A method for processing print data defining a pattern to be printed comprises obtaining (S) of vector print data for the pattern to be printed. The vector print data is divided (S) into vector print data of scan strips, wherein each scan strip is associated with a scan velocity. A skew transformation of the vector print data is performed (S) in each scan strip. The skew transformation is performed in a direction opposite to respective scan velocity and with a magnitude proportional to a magnitude of the scan velocity. A method for printing a pattern, a device for processing print data and a printing device according to the same principles are also disclosed.

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Taby, Sweden

Fredric Ihren