Asml Netherlands B.v.

Frederik Antonius Van Der Zanden

Erik Henricus Egidius Catharina Eummelen

Victor Manuel Blanco Carballo

Cornelius Maria Rops

Ronald Van Der Ham

Giovanni Luca Gattobigio

Yuri Johannes Gabriël Van De Vijver

David Bessems

Norbertus Josephus Martinus Van Den Nieuwelaar

Jorge Alberto Vieyra Salas

Bert Dirk Scholten

Pieter Lein Joseph Gunter

Ronald Frank Kox

David Merritt Phillips

Walter Theodorus Matheus Stals

Marijn Wouters

Casper Roderik De Groot

Rolf Hendrikus Jacobus Custers

Wilhelmus Antonius Wernaart

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure COgas so as to provide a substantially pure COgas environment adjacent to, and radially outward of, the space.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

Growing community of inventors

Veldhoven, Netherlands

Frederik Antonius Van Der Zanden