Fei Comapny

Fredericus Bernardus Kiewiet

Pieter Kruit

Alexander Henstra

Hendrik Nicolaas Slingerland

Otger Jan Luiten

Erik René Kieft

Guido Martinus Henricus Knippels

Petrus Henricus Antonius Mutsaers

Adam Christopher Lassise

Edgar Jan Dirk Vredenbregt

Benjamin John Cook

Jacques Nonhebel

The invention relates to a charged-particle microscope comprising The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

Beam pulsing device for use in charged-particle microscopy

The invention relates to an electrostatic beam blanker for a particle-optical apparatus, in which the blanker is used to generate a train of pulses with a fixed repetition rate. Such pulse trains with a sub-picosecond pulse length are for example used in the study of chemistry in the femtosecond scale. The beam blanker according to the invention uses a resonant structure, as a result of which the voltage is amplified by the quality factor Q of the resonant structure. During each zero-crossing of the signal, thus twice per period of the resonant frequency, the beam is transmitted, and the beam is blanked during the rest of the time. In a preferred embodiment the resonant structure comprises a transmission line. Impedance matching of signal source and resonant structure may be performed by tuning stubs.

Beam blanker for interrupting a beam of charged particles

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Eindhoven, Netherlands

Fredericus Bernardus Kiewiet