Alliedsignal Inc.

Allied Corporation

Hoechst Celanese Corporation

Other

Frederick R Hopf

Michael J McFarland

Bryce C Oxenrider

Karl Wayne Beeson

James T Yardley

Harry E Ulmer

Morris B Berenbaum

Charles J Cole

Christopher E Osuch

John H Bonfield

Paul W Harris

Thomas P Izod

Himangshu R Bhattacharjee

Karen M Bland

A new class of sulfonated 2-(2'-hydroxyaryl)-2H-benzotriazole compounds and method for using them and other sulfonated hydroxyaryl benzotriazoles on nylon fibers to improve stain resistance and dye lightfastness has been discovered. A process is provided for improving stain resistance of nylon fibers by treatment with sulfonated aromatic-formaldehyde condensate and fluorinated dry soil resist agents.

Sulfonated 2-(2'-hydroxyaryl)-2H-benzotriazoles and/or sulfonated

Actinic (deep ultraviolet, ultraviolet and visible) light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of CO--NH--CO groups, such as maleimide and especially maleimide--substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or .alpha.-methylstyrene in a 1:1 molar ratio. The preferred methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-B in Table I. The present invention also comtemplates photosensitive elements and thermally stable phtochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photo-chemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230.degree. C. and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.

Photochemical image process of positive photoresist element with

This invention relates to novel compositions for imparting stain resistance to fibers, which composition comprises a phenolic or naphtholic resin.

Process for imparting stain resistance to fibers and to anti-staining

Disclosed are substituted derivatives of 5-diazobarbituric acid selected from those having the formulas: ##STR1## wherein R.sub.1 and R.sub.2 are substituents selected from the group consisting of C.sub.3 to C.sub.12 alkyl, cyclohexyl, benzyl and C.sub.2 to C.sub.6 aralkyl groups, wherein R.sub.3 and R.sub.4 are substituents selected from the group consisting of C.sub.1 to C.sub.12 alkyl, cyclohexyl, benzyl or other C.sub.2 to C.sub.6 aralkyl groups and R.sub.5 is selected from the group consisting of .alpha.,.omega.-disubstituted C.sub.2 to C.sub.12 alkyl, methylene dicyclohexyl, or C.sub.1 to C.sub.6 dialkylphenylene. These compounds provide DUV response with an absorption maximum near 260 nm. The substituents are chosen to be nonabsorbing alkyl groups that allow efficient photobleaching of the sensitizer during exposure. The sensitizers of the present invention are designed to function in the DUV region and are useful in the manufacture of semi-conductor devices.

1,3 Disubstituted-5-diazobarbituric acids

Actinic (deep ultraviolet, ultraviolet and visible) light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of --CO--NH--CO-- groups, such as maleimide and especially maleimide-substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or .alpha.-methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-B in Table I. The present invention also contemplates photosensitive elements and thermally stable photochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photochemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230.degree. C. and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.

Positive photoresist thermally stable compositions and elements having

Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric

An etchable electrophotographic printing plate comprising a coating on a surface of an electroconductive support such as grained, anodized aluminum of effective amounts of photoconductive ZnO and of a sensitizing dye dispersed in an organic resin binder comprised of about 60-90 wt. % of C.sub.2 -C.sub.4 alkenyl C.sub.2 -C.sub.8 alkanoate, about 5-30 wt. % of di(C.sub.1 -C.sub.8 alkyl) C.sub.4 -C.sub.8 alkenedionate, about 2-8 wt. % of C.sub.3 -C.sub.8 alkenoic acid or C.sub.4 -C.sub.8 alkenedioic acid, and about 0.5-5.0 wt. % of a cross-linking agent. The preferred thermally cross-linkable organic resin binder is a random copolymer of 70 wt. % vinyl acetate, 24 wt. % dibutyl maleate; 5 wt. % acrylic acid and 1 wt. % glycidyl methacrylate. The etchable printing plate of the present invention is environmentally safe, has excellent shelf life and high sensitivity to actinic radiation. A process of image-wise exposure of the etchable electrophotographic printing plate to a low-power laser combined with an environmentally-safe aqueous etchant to prepare a printing plate that provided 100,000 good quality impressions is also disclosed.

Etchable electrophotographic long-run printing plate and method of

Electrophotographic compositions containing zinc oxide dispersed in a certain resin binder mixture and sensitized with a cyanine dye having a particular structure provide high sensitivity in the 780-840 nm wavelength range, excellent thermal stability, long dark decay time and near-white appearance. The compositions are particularly useful for non-transfer electrophotography and for electrostatic printing applications.

Growing community of inventors

Parsippany, NJ, United States of America

Frederick R Hopf