Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Commissariat a L'energie Atomique

Stmicroelectronics (crolles 2) Sas

Stmicroelectronics (rousset) Sas

Frederic-Xavier Gaillard

Fabrice Nemouchi

Stefan Landis

Jean-Christophe Coiffic

Nicolas Posseme

Yves Morand

Vincent Reboud

Eric Ollier

Jean Charbonnier

Olivier Raccurt

Sophie Giroud

Lamia Nouri

Carine Marcoux

Claire Fournier

Sofiane Ben Mbarek

Sébastien Desplobain

A method for producing at least one pattern in a substrate is provided, including providing a substrate having a front face surmounted by at least one masking layer carrying at least one mask pattern, carrying out an ion implantation of the substrate so as to form at least one first zone having a resistivity &#x3c1;1 less than a resistivity &#x3c1;2 of at least one second non-modified zone, after the ion implantation step, immersing the substrate in an electrolyte, and removing the at least one first zone selectively at the at least one second zone, the removing including at least an application of an electrochemistry step to the substrate to cause a porosification of the at least one first zone selectively at the at least one second zone.

Method for producing patterns in a substrate

Method for producing an interface for assembling temporarily a microelectronic support and a handle, comprising at least the formation of a first layer comprising at least one material capable of releasing at least one chemical species under the action of a physical-chemical treatment, the formation of a second layer comprising at least one material capable of receiving the at least one chemical species so as to cause its embrittlement, and the embrittlement of the interface by application of a heat treatment, such that the at least one species is released from the first layer and reacts with all or part of the material of the second layer.

Method for producing an interface intended to assemble temporarily a microelectronic support and a manipulation handle, and temporary assembly interface

A process for making at least one porous area (ZP) of a microelectronic structure in at least one part of an conducting active layer (), the active layer () forming a front face of a stack, the stack comprising a back face () of conducting material and an insulating layer () interposed between the active layer () and the back face (), said process comprising the steps of:

Process for electrochemically making at least one porous area of a micro and/or nanoelectronic structure

A method for manufacturing a microelectronic device is provided, including forming a first semiconductor material layer on a first region of a top surface of a substrate; and forming a second semiconductor material layer on a second region of the top surface of the substrate distinct from the first region, forming a first metallic layer above the first layer; forming a first contact layer of a first intermetallic compound or solid solution; forming a first sacrificial layer in an upper portion of the first contact layer; forming a second sacrificial layer in an upper portion of the second layer; removing all of the second sacrificial layer so as to expose a residual portion of the second layer; partially removing the first sacrificial layer; forming a second metallic layer above said residual portion; and forming a second contact layer of a second intermetallic compound or solid solution.

Method for manufacturing a microelectronic device including depositing identical or different metallic layers on the same wafer

The light-emitting diode includes first and second layers of semiconductor material, having opposite conductivity types, an active light-emitting area located between the first and second layers of semiconductor material, an electrode arranged on the first layer of semiconductor material and a photonic crystal formed in the first layer of semiconductor material. The photonic crystal and the electrode are separated by a distance optimized to simultaneously promote the electric injection and minimize the light absorption in the LED.

Light-emitting diode with local photonic crystals

Method for making at least one first suspended part of a microelectronic or nanoelectronic structure from a monolithic part of a first substrate, the method comprising the following steps:

Method for making a suspended part of a microelectronic and/or nanoelectronic structure in a monolithic part of a substrate

A method for producing a substrate, the method including: forming a porous zone in an inner layer of the substrate; progressively thinning a thickness of the substrate towards the inner layer including the porous zone; completing the progressively thinning by polishing; and controlled stopping of the polishing by detecting the porous zone during the polishing, the detecting including measuring at least one measurable physical parameter admitting a significant variation during a transition between two layers.

Method for producing a substrate including a step of thinning with stop when a porous zone is detected

A porous silicon zone is metallized by performing in situ reduction of metallic ions dissolved in an aqueous solution and fixing of the metallic particles obtained on said zone in a single step. This step consists in particular in bringing the solution containing the metallic ions into contact with the zone to be metallized, the surface whereof has previously been functionalized to enable in situ reduction of the metallic ions and fixing of the metallic particles. Functionalization of the porous silicon zone is achieved by grafting two particular and distinct types of chemical functions. The first function used is a chelating chemical function for the metallic ions and/or for the metal corresponding to the metallic ions, whereas the second function is a reducing chemical function for the metallic ions. Such a metallization can be used for producing an electrically conducting porous diffusion layer of a fuel cell.

Metallization of a porous silicon zone by in situ reduction and application to a fuel cell

The method for forming a multilayer structure on a substrate comprises providing a stack successively comprising an electron hole blocking layer, a first layer made from N-doped semiconductor material having a dopant concentration greater than or equal to 10atoms/cmor P-doped semiconductor material, and a second layer made from semiconductor material of different nature. A lateral electric contact pad is made between the first layer and the substrate, and the material of the first layer is subjected to anodic treatment in an electrolyte.

Method for forming a multilayer structure

A method for producing an electro-mechanical microsystem including movable mechanical parts, said method including a phase of releasing at least one movable mechanical part, wherein the releasing phase includes the following steps: formation of at least one porous zone in a first wafer of a semiconductor material; formation of at least a pattern of a material that makes at least one movable mechanical part on a front face of the first wafer and at least a partial encapsulation of the pattern in a sacrificial layer; release of the movable mechanical part through a rear face of the first wafer throughout the porous zone, using a solvent of the sacrificial layer.

Method for producing an electro-mechanical microsystem

A target layer comprising at least one degradable material is deposited on a support. Nanotubes are then formed on the degradable material of the target layer before deposition of an insulating layer is performed. Degradation of the degradable material and elimination of degradation sub-products are then performed by means of the nanotubes passing through the insulating layer thus forming air gaps in the target layer.

Method for producing air gaps using nanotubes

A target layer with holes is formed on a bottom conducting layer. Nanotubes are formed in the holes from the bottom conducting layer. A flat insulating layer is then deposited on the target layer, the nanotubes passing through the insulating layer. Air gaps are then formed by selective decomposition of the target layer. The decomposition agent and/or decomposition by-products use the walls and the central holes of the nanotubes to pass between the target layer and the outside. After decomposition, the top conducting layer is formed on the insulating layer. The nanotubes then electrically connect the conducting layers.

Growing community of inventors

Voiron, France

Frederic-Xavier Gaillard