Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Commissariat a L'energie Atomique

Centre National De La Recherche Scientifique

Frédéric Sanchette

Cédric Ducros

Caroline Chouquet

Denis Camel

Fabrice Emieux

Stéphanie Thollon

Christophe Secouard

Sophie Mailley

Pierre Juliet

Laurent Bedel

Stephanie Huet

Marion Le Flem

Jérôme Gavillet

Vincent Sanzone

Multilayer material comprising a zirconium-based substrate covered with a multilayer coating, the multilayer coating comprising metallic layers composed of identical or different substances chosen from chromium, a chromium alloy or a ternary alloy of the Nb&#x2014;Cr&#x2014;Ti system. Such a material has improved resistance to oxidation in accident conditions of a nuclear reactor. The invention also relates to a multilayer coating, a part composed wholly or partly of the multilayer material or of the multilayer coating, as well as the method for manufacturing the multilayer material such as for example a magnetron cathodic sputtering process.

Multilayer material resistant to oxidation in a nuclear environment

This method for texturing a DLC coating comprises depositing a single layer of balls or spheres on the free surface of the DLC coating; dry-etching the DLC coating using oxygen plasma; and lastly, cleaning the surface of said coating by eliminating the balls or spheres.

Method for texturing DLC coatings, and textured DLC coatings thus obtained

The invention relates to a hydrogenated amorphous carbon coating and to a method for the production thereof. It also relates to devices having such a coating. The method of the invention consists in producing a hydrogenated amorphous carbon coating comprising at least two layers of hydrogenated amorphous carbon, each of said layers having chemical compositions and physical and mechanical properties that are identical, and with thicknesses that are identical or different. The coating of the invention finds many applications, in particular in the mechanical field for parts subject to considerable wear and rubbing problems. It may also be applicable, in particular, in the field of surgical implants and in the MEMS (microelectromechanical systems) field.

Method of producing a hydrogenated amorphous carbon coating

A cathode for an electrochemical reactor including a diffusion layer and a catalyst layer. The cathode has bimetallic or multimetallic nanoparticles, dispersed in direct contact with the diffusion layer, at least one of the metals being chromium (Cr) wholly or partly in oxidized form. The cathode is fabricated by depositing the bimetallic or multimetallic nanoparticles on the diffusion layer by DLI-MOCVD in the presence of O.

Cathode for electrochemical reactor, electrochemical reactor incorporating such cathodes and method for making said cathode

A process for fabricating a silicon-based thin-film photovoltaic cell, applicable for example in the energy generation field. The fabrication process includes a) depositing a p-doped or n-doped amorphous silicon film, the X-ray diffraction spectrum of which has a line centered at 28&#xb0; that has a mid-height width, denoted by a, such that 4.7&#xb0;&#x2266;a&#x3c;6.0&#xb0;, on a substrate.

Process for fabricating a silicon-based thin-film photovoltaic cell

The sulfidation resistance of a silver-base material coating is further improved by making a concentration gradient of silver, oxygen and of one or more oxidizable alloying elements that may be present in the material, from the free surface of the coating up to a depth comprised between 10 nm and 1 &#x3bc;m and more particularly between 100 nm and 1 &#x3bc;m. Thus, the coating comprises a stack of one main layer made from silver-base material and of one oxidized thin film. The thin film, with a thickness comprised between 10 nm and 1 &#x3bc;m, thus presents a decreasing silver concentration gradient from the interface between the thin film and the main layer to the free surface of the thin film. Deposition of the coating on a support can be achieved by two successive physical vapor deposition steps, and more particularly by magnetron cathode sputtering.

Sulfidation-resistant silver-base coating, method for depositing such a coating and use thereof

The invention concerns a method for making a photovoltaic cell based on thin film silicon, which consists in providing a heterojunction by depositing on a support at least one first P&#x2014; (or N&#x2014;) doped amorphous silicon layer () and a second N&#x2014; (or P&#x2014;) doped amorphous silicon layer (), in crystallizing, at least partly, the at least one first layer () using a technology for crystallizing silicon by pulsed electronic beam.

Growing community of inventors

Montferrat, France

Frédéric Sanchette