Soleras Advanced Coatings Bv

Freddy Fack

Wilmert De Bosscher

Guy Gobin

Ignacio Caretti Giangaspro

Wilmert Cyriel Stefaan De Bosscher

David Karel Debruyne

Hubert Eliano

David Debruyne

Tom Cottens

A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.

Tungsten suboxide ceramic target

A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29&#xb0;+/&#x2212;0.3&#xb0;, or a tetragonal phase ZrO2 2-theta peak at 30.05&#xb0;+/&#x2212;0.3&#xb0;. The target has a low resistivity, below 1000 ohm&#xb7;cm, preferably below 100 ohm&#xb7;cm, more preferably below 10 ohm&#xb7;cm, even lower than 1 ohm&#xb7;cm.

Conductive sputter targets with silicon, zirconium and oxygen

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Mariakerke, Belgium

Freddy Fack