Robert Boschgmbh

Frauke Driewer

Roland Mueller-Fiedler

Klaus Breitschwerdt

Andreas Kern

Andre Mueller

Nils Kummer

A method is proposed for producing three-dimensional structures, especially microlenses, in a substrate using an etching process, at least one original shape having a known original surface shape being present initially on the substrate in a plurality of places. The etching process has at least one first etching removal rate a and a second etching removal rate a which are material-dependent, and of which at least one is changeable as a function of time. The original shape is converted to a target shape by the etching process, the original surface shape of the original shape and the target surface shape of the target shape to be reached being known before the beginning of the etching process. In order to achieve the target surface shape, at least one of the etching rates a or a is set by a change of at least one etching parameter calculated before the beginning of the etching process as a function of the etching time.

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Ettlingen, Germany

Frauke Driewer