Asml Netherlands B.v.

Fransiscus Hendrikus Van Deuren

Erik Roelof Loopstra

Jan Van Eijk

Robert-Han Munnig Schmidt

Felix Godfried Peter Peeters

Gerard Van Schothorst

A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

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Valkenswaard, Netherlands

Fransiscus Hendrikus Van Deuren