Other

Zhuangzi Li and Associates

Franklin Mark Schellenberg

Keith Edward Bennett

Zhuangzi Li

Yuri Granik

Patrick Joseph LaCour

Nicolas Bailey Cobb

Juan Andres Torres Robles

Andrew J Moore

Wilhelm Maurer

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structure, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the 'bow-tie' and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

Method and system for nanoscale data recording

This Application discloses the display of stored information when creating a electronic command for use with mobile smartphones and other computer-enabled telephones. A software app recognizes input from the user (such as the initial digits of a phone number) that identifies the organization to be called, and accesses stored representations of information along with corresponding IVR phone tree information and user display preferences. The app then presents a representation of all or part of the retrieved information on a display using the user's language preferences. The user can then respond to the representation by providing selective inputs that cause the synthesis all or part of the commands needed to navigate to the desired destination. Once a command sequence has been synthesized, the user may provide additional input that the system interprets as an instruction to open a phone call and invoke the assembled commands.

Visual translation for telephone commands

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

This application discloses the display of stored information when creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app recognizes input from the user (such as the initial digits of a phone number) that identifies the organization to be called, and accesses stored representations of information along with corresponding IVR phone tree information and user display preferences. The app then presents a representation of all or part of the retrieved information on a display using the user's language preferences. The user can then respond to the representation by providing selective inputs that cause the synthesis all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.

Visual translation for an IVR system

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.

An super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures.

Nanoscale pattern exposure system

An super-resolution system for nano-patterning is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.

System for creating nanoscale patterns

An optical device for performing nanolithography is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.

Super-resolution exposure system

A method of performing nanolithography is disclosed, comprising the use of a system having a plasmonic writing head that enables super-resolution exposures of a material. The super-resolution exposures are carried out using light directed onto a material using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a lithography material. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. A detector system using light of a second wavelength to monitor the exposures is also provided.

Method for writing nanoscale patterns

The invention is a method of creating a dialstring for use with mobile smartphones and other computer-enabled telephones. A software app designed to implement the method recognizes input from the user that identifies an organization to be called, and accesses a stored representation of a corresponding IVR phone tree. The app then presents a graphical representation of all or part of the phone tree on the display of the telephone in a language that is different than the language used in the phone tree. The user can then respond by providing selective inputs that cause the app to synthesize all or part of the dialstring needed to navigate the phone tree to the desired destination. Once a dialing option has been synthesized to the user's satisfaction, the user may provide additional input that the system interprets as an instruction to open a phone call and dial the synthesized number.

A method of performing nanopatterning is disclosed, comprising the use of a system comprising a plasmonic writing head that enables super-resolution exposures. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.

Method and system for nanopatterning

A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light transmitted through specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the object to be exposed. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the multiple individual channels and the multiple exposures.

Method for nanolithography

A method for fabricating waveguides comprising nano-apertures for illumination of sub-resolution exposures is presented. In particular, the end of a waveguide, such as an optical fiber, is coated with a material, such as an electrically conducting metal or a semiconductor. This material is then selectively removed through a lithography process using photon exposure to create an aperture in the material at the end of the waveguide. Under normal conditions, if the aperture is smaller than the wavelength of light in the waveguide, there is little or no transmission through the aperture. However, with the appropriate selection of materials and aperture geometry, for example a metallic conducting coating and sub-wavelength 'C-shaped' or 'bow-tie' aperture, enhancement of the transmission of light through the aperture can be achieved, allowing effective illumination of sub-resolution spots using the nano-aperture. This can be used in a nanolithography system incorporating waveguide illuminators as well.

Growing community of inventors

Palo Alto, CA, United States of America

Franklin Mark Schellenberg