Asml Netherlands B.v.

Frank Van Schaik

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Hans Butler

Jeroen Johannes Sophia Maria Mertens

Joeri Lof

Helmar Van Santen

Alexander Straaijer

Klaus Simon

Timotheus Franciscus Sengers

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Aleksey Yurievich Kolesnychenko

Roelof Aeilko Siebrand Ritsema

Christiaan Alexander Hoogendam

Bob Streefkerk

Erik Theodorus Maria Bijlaart

Arie Jeffrey Den Boef

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Mark Kroon

Hans Jansen

Antonius Theodorus Anna Maria Derksen

Jacobus Johannus Leonardus Hendricus Verspay

Aleksey Yurievich Kolensnychenko

Roelof Aeilko Siebranc Ritsema

Gerardus J J Keijsers

Roelof Aeiko Siebrand Ritsema

Sjoerd Nicolaas Lamburtus Donders

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid

An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

Lithographic apparatus and device manufacturing method involving a member and a fluid opening

An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.

Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Growing community of inventors

Eindhoven, Netherlands

Frank Van Schaik