Varian Semiconductor Equipment Associates, Inc.

Applied Materials, Inc.

Eaton Corporation

Axcelis Technologies, Inc.

Semequip, Inc.

Frank Sinclair

Shengwu Chang

Joseph C Olson

Bon-Woong Koo

Peter Lawrence Kellerman

Alexandre Likhanskii

Victor M Benveniste

Svetlana Radovanov

Costel Biloiu

Paul J Murphy

Charles T Carlson

Julian G Blake

Eric D Hermanson

Christopher W Campbell

Robert C Lindberg

David T Blahnik

Daniel R Tieger

Antonella Cucchetti

Jun Lu

Craig Richard Chaney

Jay Thomas Scheuer

Christopher A Rowland

Frederick M Carlson

William Davis Lee

Peter F Kurunczi

Kenneth Harry Purser

Alexander S Perel

Tseh-Jen Hsieh

Alexander C Kontos

James S Buff

You Chia Li

Michael D Johnson

Wai-Ming Tam

Ludovic Godet

Robert Brent Vopat

Klaus Becker

Shardul Patel

Michael Honan

Joseph E Pierro

Michael S DeLucia

Robert J Mitchell

Graham Wright

Wilhelm P Platow

D Jeffrey Lischer

Ronald Johnson

Tyler Burton Rockwell

Rajesh Dorai

Michael St Peter

Jay S Johnson

Anthony Renau

Neil J Bassom

Russell J Low

Nicholas P T Bateman

Jonathan Gerald England

Dale K Stone

Roger Bradford Fish

Jay R Wallace

Kevin M Daniels

Dawei Sun

George Gammel

Eric R Cobb

Stanislav S Todorov

Ernest E Allen

Ernest Everett Allen

Edward W Bell

Richard Allen Sprenkle

Norman E Hussey

David R Timberlake

Nunzio V Carbone

Krag R Senior

Bon Woong Koo

Kurt T Decker-Lucke

Morgan Evans

William Tyler Weaver

Timothy J Miller

Vikram Singh

Connie P Wang

William F DiVergilio

Richard John Hertel

Paul Sullivan

Aaron Webb

Patrick M Martin

James Paul Buonodono

Douglas R Adams

Piotr R Lubicki

Daniel Distaso

David J Morrell

Helen L Maynard

Joseph P Dzengeleski

Ala Moradian

Brian H Mackintosh

William Leavitt

Stephen Krause

Philip Layne

Nandish Desai

Steven C Borichevsky

Gregory Citver

Jiong Chen

James Alan Pixley

Christopher Lupoli

An apparatus may include a drift tube assembly, comprising a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein the plurality of drift tubes further define a plurality of RF quadrupoles, respectively. As such, the plurality of quadrupoles are arranged to defocus the ion beam along a first direction at the plurality of acceleration gaps, respectively, where the first direction extends perpendicularly to the beam propagation direction.

Particle accelerator having novel electrode configuration for quadrupole focusing

Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, a LINAC may include a coil resonator and a plurality of drift tubes coupled to the coil resonator by a set of flexible leads.

Linear accelerator assembly including flexible high-voltage connection

A load lock in which the pumping speed is controlled so as to minimize the possibility of condensation is disclosed. The load lock is in communication with a vacuum pump and a valve. A controller is used to control the valve such that the supersaturation ratio within the load lock does not exceed a predetermined threshold, which is less than or equal to the critical value at which vapor condenses. In certain embodiments, a computer model is used to generate a profile, which may be a pumping speed profile or a pressure profile, and the valve is controlled according to the profile. In another embodiment, the load lock comprises a temperature sensor and a pressure sensor. The controller may calculate the supersaturation ratio based on these parameters and control the valve accordingly.

Model-based controlled load lock pumping scheme

Single-slot tubular cathode

An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.

Resonator, linear accelerator configuration and ion implantation system having rotating exciter

An apparatus may include a cyclotron to receive an ion beam as an incident ion beam at an initial energy, and output the ion beam as an accelerated ion beam at an accelerated ion energy. The apparatus may further include an RF source to output an RF power signal to the cyclotron chamber, the RF power source comprising a variable power amplifier, and a movable stripper, translatable to intercept the ion beam within the cyclotron at a continuum of different positions.

Cyclotron having continuously variable energy output

An apparatus may include a drift tube assembly having a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal. The apparatus may also include a DC electrode assembly that includes a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube. The DC electrode assembly may also include a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.

Drift tube electrode arrangement having direct current optics

A system comprising a spinning disk is disclosed. The system comprises a semiconductor processing system, such as a high energy implantation system. The semiconductor processing system produces a spot ion beam, which is directed to a plurality of workpieces, which are disposed on the spinning disk. The spinning disk comprises a rotating central hub with a plurality of platens. The plurality of platens may extend outward from the central hub and workpieces are electrostatically clamped to the platens. The plurality of platens may also be capable of rotation. The central hub also controls the rotation of each of the platens about an axis orthogonal to the rotation axis of the central hub. In this way, variable angle implants may be performed. Additionally, this allows the workpieces to be mounted while in a horizontal orientation.

Spinning disk with electrostatic clamped platens for ion implantation

A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.

Apparatus and system including high angle extraction optics

A coil inductor for use with a LINAC is disclosed. The coil inductor comprises one or more tubes, wherein each tube comprises an interior support structure to strengthen the tubes. By supporting the tube, the amount of vibration is reduced, allowing the coil to resonate at its natural frequency. In some embodiments, the interior structure comprises one or more interior walls. These interior walls may be used to create a plurality of fluid channels that allow the flow of coolant through the tubes. An end cap may be disposed on the second end of the tubes to allow fluid communication between the supply fluid channels and the return fluid channels. The first ends of the one or more tubes may be connected to a manifold that includes a supply port and a return port for the passage of coolant.

Stiffened RF LINAC coil inductor with internal support structure

An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path. The apparatus may include a resonator, to output an RF signal to the drift tube assembly, and an RF quadrupole triplet, connected to the drift tube assembly, and arranged circumferentially around the beam path.

RF quadrupole particle accelerator

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Resonator coil having an asymmetrical profile

Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.

Modular linear accelerator assembly

Growing community of inventors

Boston, MA, United States of America

Frank Sinclair