Applied Materials, Inc.

Elevated Materials US LLC

Frank Schnappenberger

Thomas Deppisch

Andreas Lopp

Anke Hellmich

Stefan Keller

Marcus Bender

Claire Armstrong

Thomas Leipnitz

Thomas Koch

Jürgen Multerer

Götz Görisch

Annemarie Flock

A roll exchange chamber for exchanging a substrate roll is described. The roll exchange chamber includes a rotatable base construction being rotatable around a central axis. The base construction comprises a first roll holder for holding a first substrate roll, a second roll holder for holding a second substrate roll, and a wall for providing a first compartment and a second compartment in the roll exchange chamber. The wall is arranged between the first roll holder and the second roll holder. Further, a roll-to-roll processing system with a roll exchange chamber as well as a method of continuously providing a flexible substrate in a roll-to-roll processing system are described.

Roll exchange chamber, roll-to-roll processing system and method of continuously providing a flexible substrate

A method () of cooling a deposition source () is described. The method includes stopping () depositing material from the deposition source, the deposition source being arranged in a deposition chamber (), and introducing () a cooling gas into the deposition chamber (), the cooling gas comprising a thermal conductivity &#x3bb; of &#x3bb;&#x2265;0.05 [W/(m*K)]. Further, a chamber for cooling a deposition source is described. The chamber includes a deposition source being arranged in the chamber. Further, the chamber includes a cooling gas supply system configured for providing a cooling gas into the chamber, the cooling gas comprising a thermal conductivity &#x3bb; of &#x3bb;&#x2265;0.05 [W/(m*K)].

Method of cooling a deposition source, chamber for cooling a deposition source and deposition system

An AC power connector for connecting an AC power supply with a device is provided. The AC power connector includes at least one first element connectable with the AC power supply and at least one second element connectable with the device, the first element and the second elements being arranged at a first distance with respect to each other for defining a capacitance, wherein the at least one first element and the at least one second element are rotatable with respect to each other, wherein the first element and the second element are configured for a transfer of an AC power between the at least one first element and the at least one second element.

AC power connector, sputtering apparatus and method therefor

A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.

Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus

It is provided a device for supporting a rotatable target of a deposition apparatus for sputtering material onto a substrate, wherein the device includes a drive unit for rotating the rotatable target; a ring-shaped part connected to the drive unit for attaching the drive unit to the rotatable target; and, a shield for covering the ring-shaped part. The shield is adapted for rotating together with the ring-shaped part and includes a plurality of parts assembled together. Furthermore, a sputtering apparatus and a method for supporting a rotatable target are provided.

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Johannesberg, Germany

Frank Schnappenberger