Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Other

Carl-zeiss-stiftung

Frank Melzer

Wolfgang Singer

Markus Weiss

Johannes Wangler

Bernhard Gellrich

Wilhelm Egle

Stefan Xalter

Martin Antoni

Joachim Hainz

Andreas Seifert

Bernhard Geuppert

Franz Sorg

Andreas Heisler

Jochen Wietzorrek

Damian Fiolka

Hubert Holderer

Yim-Bun Patrick Kwan

Michael Muehlbeyer

Thomas Ittner

Erich Schubert

Joachim Wietzorrek

Heinz Mann

Vadim Yevgenyevich Banine

Axel Scholz

Bernd Kleemann

Berndt Warm

Ulrich Bingel

Michael Mühlbeyer

Stefan Dornheim

Martin Bayer

Karlfried Osterried

Jurgen Faltus

Jürgen Faltus

An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0&#xb0; and 90&#xb0;, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.

Optical system for semiconductor lithography

The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.

Method and system for indirect determination of local irradiance in an optical system

A focusing-device for the radiation from a light source () is provided with a collector mirror (') which is arranged in a mount () and collects the light, in virtual or real terms, from the light source () at the second focus (). The collector mirror (&#x2032;) is displaceably connected to the mount () via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.

Focusing-device for the radiation from a light source

An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.

Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component

There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end.

Collector configured of mirror shells

A facet mirror () is provided with a number of mirror facets (), in which the mirror facets () respectively have a spherical or conical facet body () with a reflecting surface (). The side of the facet body () averted from the reflecting surface () is mounted in a bearing device ().

Facet mirror having a number of mirror facets

There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength &#x2266;193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Collector with fastening devices for fastening mirror shells

There is provided a collector for illumination systems for light having a wavelength &#x2266;193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Collector having unused region for illumination systems using a wavelength &#x2266;193 nm

A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths &#x2266;193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt. The location and/or angles of the second screen elements of the second optical element can be adjusted individually and independently of one another in order to realize another assignment of the first screen elements of the first optical element to the second screen elements of the second optical element by displacing and/or tilting the first and second screen elements.

Lighting system, particularly for use in extreme ultraviolet (EUV) lithography

In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

In a method of connecting a multiplicity of optical elements () to a basic body (), in particular for producing a faceted mirror (), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements () are positioned on the basic body () and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure () and the optical elements () are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure () as the basic body.

Method of connecting a multiplicity of optical elements to a basic body

Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm

Growing community of inventors

Utzmemmingen, Germany

Frank Melzer