Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

University of Virginia Patent Foundation

Glatt Ingenieurtechnik Gmbh

Glatt Systemtechnik Gmbh

Frank-Holm Roegner

Haydn N G Wadley

Henry Morgner

Ralf Kretzschmar

Christiane Wetzel

Olaf Roeder

Goesta Mattausch

Reinhard Boeber

Henrik Flaske

Thomas Wegner

Wolfgang Prahl

A plasma generation process that is more optimized for vapor deposition processes in general, and particularly for directed vapor deposition processing. The features of such an approach enables a robust and reliable coaxial plasma capability in which the plasma jet is coaxial with the vapor plume, rather than the orthogonal configuration creating the previous disadvantages. In this way, the previous deformation of the vapor gas jet by the work gas stream of the hollow cathode pipe can be avoided and the carrier gas consumption needed for shaping the vapor plume can be significantly decreased.

Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof

Method and device for inactivating a microbiologically contaminated mass containing solid particles. The method includes mixing the mass containing solid particles with a gelatinizing agent, transporting the mixed mass of solid particles and gelatinizing agent through a shaping device structured so that the mixed mass, at least in one area, is shaped to form a lamellar volume with a layer thickness of between 1 mm and 3 mm, and impinging the formed lamellar volume of the mixed mass with accelerated electrons.

Method and device for inactivating a microbiologically contaminated mass containing solid particles with accelerated electrons

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Dresden, Germany

Frank-Holm Roegner