Eastman-kodak Company

Frank G Webster

Michael T Regan

Louis J Rossi

George A Reynolds

James A Van Allan

James R Nonnemacher

Steven G Link

Thomas R Klose

Merocyanine-cyanine-merocyanine (MCM) electrically photosensitive

Electrically photosensitive materials and elements comprising an electrically photosensitive compound of the structure: ##STR1## wherein: n represents zero, 1 or 2;

Electrically photosensitive materials and elements for

Electrophotosensitive materials having the structure ##STR1## wherein: M and N may be zero, one or two;

Electrophotosensitive materials for migration imaging processes

Electrophotosensitive materials having the structure ##STR1## wherein: Z.sup.1 and Z.sup.2 represent a basic type heterocyclic nucleus;

Organic electrophotosensitive materials for migration imaging processes

Electrophotosensitive materials having the structure ##STR1## wherein: a and b represent zero, one or two;

Electrophotosensitive materials having the structure ##STR1## wherein R represents a basic heterocyclic nucleus as well as groups such as hydrogen, alkyl, aryl, aralkyl, etc.;

Isoquinolinedione photoelectrophoretic materials for imaging processes

Electrophotosensitive materials having the structure ##STR1## wherein: r and s may be zero, one two or three;

Organic heterocyclic electrophotosensitive materials for migration

Electrophotosensitive materials having the structure ##STR1## wherein: A AND B REPRESENT ZERO, ONE OR TWO;

Novel compounds having the following structure ##STR1## wherein X represents O, S or NR and R is benzyl or butyl;

Heterocyclic ethenyl or vinyl heterocyclic or aromatic compounds for

Materials having the following structure ##STR1## have been found useful in migration imaging processes.

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Rochester, NY, United States of America

Frank G Webster