Schott Glas

Schott Ml Gmbh

J-plasma Gmbh

Schott Ag

Frank Coriand

Jochen Alkemper

Andreas Menzel

Wolfgang Schmidt

Andreas Voitsch

Lothar Brehm

Ute Natura

Thomas Schmiady

Wolfgang Triebel

Oliver Sohr

Christian Muehlig

Matthias Schmidt

Rolf Martin

Walter Nadrag

Siegfried Kufert

Sylvia Bark-Zollmann

Ulrich Strobel

Gordon Von Der Gönna

A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of at least 800 mm. The method is characterized in that fabrication is performed from a cylindrical rod lens element made from synthetic quartz glass material configured as a fused silica ingot. This is performed using a flame hydrolysis method with a direct one stage deposition process of SIOparticles from a flame stream onto die that rotates and is moveable in a linear manner with respect to the flame stream.

Method and device for producing rod lenses

The present invention refers to a method for the quantitative measurement of the pulse laser stability of synthetic fused silica, whereby this method avoids time-consuming and demanding measurements and saves material. First, the absorption of fused silica is measured for different energy densities, and a non-linear function &#x3b1;(H) is determined on the basis of the measured values. Second, the fused silica is subject to radiation with a higher energy density up to the point at which a constant absorption value is achieved. In the following, the absorption of the fused silica is measured at different energy densities, and a non-linear function &#x3b1;(H) is determined. The difference between the two non-linear functions indicates the increase of absorption that depends on the energy density.

Method for the quantitative measurement of the pulse laser stability of synthetic fused silica glass

A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains &#x2267;1150 ppm OH, a strain double refraction of &#x2266;5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &#x394;T &#x2266;0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &#x3bb;=248 nm, laser shot frequency &#x2267;300 Hz, laser shot value &#x2267;10and lumination &#x2266;10 mJ/cm, and wavelength &#x3bb;=193 nm, laser shot frequency &#x2267;300 Hz, laser shot value &#x2267;10and lumination &#x3c;5 mJ/cm. Apparatus for producing the preform comprises a horizontally positioned muffle with two different sized openings facing each other. The larger of the openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

Apparatus for producing synthetic quartz glass

A method produces homogenous quartz glass plates without streaks. The method is applied to starting quartz glass body which has an X&mdash;X geometrical axis and good refractive index homogeneity in its central area, and a refractive index homogeneity decreasing as the axis lies further from a central area. The body is divided into at least two concave parts by longitudinal cuts parallel to the axis once the central area has been processed out of the body. The parts are placed separately in corresponding molds and heated therein such that they are molded to form quartz glass plates having a desired thickness.

Quartz glass plates with high refractive index homogeneity

The invention relates to a synthetic quartz glass preform which is produced according to the flame hydrolysis technique with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. Said preform has a core area which contains &gE;1150 ppm OH, a strain double refraction of &lE;5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &Dgr; T &lE;0.1 %/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &lgr; &equals;248 nm, laser shot frequency &gE;300 Hz, laser shot value &gE;10 and rumination &lE;10 mJ/cm , and wavelength &lgr; &equals;193 nm, laser shot frequency &gE;300 Hz, laser shot value &gE;10 and rumination &lE;5 mJ/cm . A device for producing said preform comprises a horizontally positioned muffle with two different-sized openings facing each other. The larger of said openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

Synthetic quartz glass preform

In a method for producing a streak-free quartz glass sheet with a highly homogeneous degree of refraction, a quartz glass rod is lowered into a melting pot parallel to a longitudinal axis of the quartz glass rod. A cross-section of the melting pot is larger than a cross-section of the quartz glass rod and determines a contour of the quartz glass sheet. The quartz glass rod is heated in the melting pot to a flow temperature whereupon the quartz glass rod is lowered until the quartz glass rod melts and a height of the quartz glass flowing in the melting pot reaches a desired quartz glass sheet thickness. The melting pot and the quartz glass rod move relative to each other in a direction which is perpendicular to the longitudinal axis of the quartz glass rod during the melting process. Preferably, the movement involves a rotational and a transverse movement.

Method and device for producing a homogenous sheet of quartz glass without streaks

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Jena, Germany

Frank Coriand