Commissariat a L'energie Atomique

Ciba-geigy Corporation

Francois Schue

Louis Giral

Charles Rosilio

Francois Buiguez

Jacques Cavezzan

Christian Prud'Homme

Sylvianne Dumas

Substrates, e.g., silicon wafers, coated with a UV-curable organopolysiloxane composition including a crosslinking catalyst therefor (e.g., a platinum group metal compound) and an amount of a crosslinking inhibitor (e.g., an azodicarboxylate) which is effective at ambient temperature, but ineffective to prevent crosslinking on exposure of the composition to ultraviolet radiation, are well adapted for the imaging of negative intelligence patterns thereon.

UV-curable organopolysiloxane compositions and negative photoresists

Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.

Silicon-containing polymer and its use as a masking resin in a

Photosensitive film based on silicon-containing polymer and its use as a

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Strasbourg, France

Francois Schue