The European Union, Represented by the European Commission

European Community (ec)

The European Community, Represented by the European Commission

University of Pavia

Plasmore Srl

François Rossi

Pascal Colpo

Andrea Valsesia

Franco Marabelli

Cloé Desmet

Silvia Giudicatti

Gerardo Marchesini

Reinhard Fendler

A nanoparticle screening chip and a method using said chip allowing for determining physical properties of nanoparticles, wherein the screening chip comprises a substrate having a working surface divided into a plurality of areas, wherein (1) each of these areas presents different surface properties defined by surface energy component (d,b,a), the total free energy &#x3b3;of the surface of each area being defined as follows: &#x3b3;=&#x3b3;+2(&#x3b3;&#x3b3;), wherein the components are: &#x3b3;=dispersive component=d, &#x3b3;=electron acceptor component=b, &#x3b3;=electron donor component=a; and (2) each of these areas comprises a plurality of subareas, each subarea comprising an array of sub-micrometric holes or elongated grooves with a different aperture size (S, S, S, . . . ).

Screening of nanoparticle properties

A sensor device comprises a dielectric substrate (); and a metal layer () on the substrate () with at least one array of cavities () therein and adapted to support L-SPR, each of the cavities () in the metal layer () having an opening () and a closed bottom () and widening from opening to bottom. A bed of dielectric material () is provided over the bottom () of each cavity () to reduce its apparent depth, the bed surface () being functionalized to bind to receptor moieties (). This sensor device is particularly designed for SPR detection, but can be used in other detection techniques.

SPR sensor device with nanostructure

A SPR sensing method comprising the steps of: providing a SPR sensor comprising a SPR supporting sensor surface and contacting a sample to be analysed with the sensor surface. At least one resonance condition at said SPR supporting sensor surface is monitored by illuminating the sensor surface with an SPR exciting test light beam and sensing the reflected or transmitted test light beam. Additionally, the sensor surface is illuminated with a reference light beam under conditions selected so as not to excite SPR at said sensor surface and sensing the intensity of the reflected or transmitted reference light beam. At least one property of the reflected or transmitted test light beam is determined taking into account the sensed intensity of the reflected or transmitted reference light beam.

Surface plasmon resonance sensing method and sensing system

An inductively coupled plasma processing apparatus () comprises a plasma chamber () with a dielectric window () forming a self-supporting wall element of the plasma chamber (). The dielectric window () has an external and an internal side with respect to the chamber (). An electromagnetic field source () is arranged in front of the external side of the dielectric window () for generating an electromagnetic field within the plasma chamber (). The field source comprises at least one magnetic core (). The at least one magnetic core () is attached to the external side of the dielectric window (), such that the at least one magnetic core helps the dielectric window () to withstand collapsing forces caused by negative pressure inside said chamber during operation.

Inductively coupled plasma processing apparatus

An apparatus for plasma treatment of a non-conductive hollow substrate, including a plurality of ionization energy sources disposed adjacent to each other all along the part of the substrate to be treated. The apparatus also includes a processor to sequentially power the plurality of ionization energy sources from a radio frequency power source. Each ionization energy source includes two parts sandwiching the substrate. The ionization energy sources can be capacitively or inductively coupled plasma sources.

Growing community of inventors

Cittiglio, Italy

François Rossi