American Air Liquide, Inc.

Air Liquide Electronics U.S. LP

Francois Doniat

Nathan Stafford

Ronald S Inman

James J F McAndrew

Jean-Louis Marc

Axel Soulet

Disclosed herein are precursors and methods for their use in the manufacture of semiconductor, photovoltaic, TFT-LCD, or flat panel type devices.

Volatile precursors for deposition of C-linked SiCOH dielectrics

The present invention provides methods for checking and calibrating one or more concentration sensors in an open or closed system. More specifically, in one embodiment of the present invention, the disclosed method allows for the checking and calibration of one or more concentration sensors in which removal of the liquid from the system is required. In two additional embodiments, the disclosed methods allow for the checking and calibration of one or more concentration sensors without having to remove the liquid from the closed system thereby minimizing contamination of the system while at the same time greatly reducing or eliminating contact of the user with the liquid.

Methods for checking and calibrating concentration sensors in a semiconductor processing chamber

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Wilmington, DE, United States of America

Francois Doniat