Hgst Netherlands, B.v.

Hitachi Global Storage Technologies Netherlands B.v.

Franck Dreyfus Rose Dit Rose

Ricardo Ruiz

Elizabeth Ann Dobisz

Joan K Bosworth

Erhard Theodor Schreck

Kurt A Rubin

Bruno Jean Marchon

Thomas Edward Karis

Bala Krishna Pathem

A method for polishing a carbon overcoat of a magnetic media that results in a smooth surface free of carbon cluster debris. The method involves forming a magnetic disk having a carbon overcoat formed thereon. The carbon overcoat is then polished in the presence of ozone (O). The heat from the polishing process along with the presence of the ozone, cause any carbon particles removed by the polishing to form COgas so that there is no remaining carbon particle debris on the surface of the disk.

Vapor phase chemical mechanical polishing of magnetic recording disks

The present disclosure relates to a protective layer composition that includes TiSiA, where A is C, CN, OC, or OCNand x, y, l, m, and n are positive integers. In one implementation, the protective layer composition has a ratio of x over (x+y) in the range of between about 0.1 and about 1.0. In another implementation, the protective layer composition has a ratio of x over (x+y) in the range of between about 0.3 and about 0.9. In yet another implementation, the protective layer composition has a ratio of x over (x+y) that is about 0.6. The protective layer composition may be amorphous. Also, the protective layer composition may include an atomic percentage of Ti that is less than about 20%. In one implementation of the protective layer composition, x is 2, y is 1, and A is C.

Titanium-silicon protective film composition and apparatus

Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure includes a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. Other systems and methods are disclosed as well.

Supporting membranes on nanometer-scale self-assembled films

Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.

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San Jose, CA, United States of America

Franck Dreyfus Rose Dit Rose